Toshniwal Instruments (Madras) Pvt. Ltd.

Kilpauk, Chennai, Tamil Nadu

TruPlasma radio frequency generators from TRUMPF Httinger provide the highest process stability of all power supplies for plasma excitation. The RF technology is therefore especially suited to processes which need the highest level of precision and reproducibility. Also in terms of energy efficiency and robustness, our RF generators are amongst the leaders on the market they are therefore the first choice for demanding applications such as the manufacture of semi-conductor elements, microchips, solar cells or flat screens.

• Optimal adjustment to process
• Maximum efficiency and Flexibility
• Closed loop control through the measurement of the RF signal directly at the input and output of the matchbox.

Ideal for use in Plasma screen manufacturing, Solar cell Industry and Semi-conductor production in processes such as:

• Reactive Ion Etching (RIE)
• Atomic Layer Deposition (ALD)
• Plasma Enhanced Chemical Vapor Deposition (PECVD)
• RF Sputtering

Induction generators from TRUMPF Httinger are the ideal solution for inductive heating and heat treatment. The spectrum ranges from classic applications such as hardening, annealing, soldering, melting, and forging, right up to special applications such as epitaxy and crystal growing according to the Czochralski process.

• The amount of space required is low, which means it can be easily integrated in any application environment
• Construction with separate parallel oscillating circuit enables flexible arrangement- a distance of up to 82 feet can be achieved between the generator and the application
• Parallel oscillating circuit technology reduces setup times, improves productivity, and extends the application spectrum
• As a result of flexible power control from almost 0% to 100%, temperature-controlled processes can be optimally controlled using the TruHeat MF Series 3000 / 5000 / 7000 generators.
• Reliability and long-term stability in operation guarantee a high level of productivity and reproducibility of the results.

• Classic applications like hardening, annealing, soldering, melting and forging
• Artificial manufacture of Crystals like crucible pulling as per Czochralski process
• Epitaxy: Deposition of single crystal layers on a substrate of same material. eg. LED manufacture

We deal with both DC generators and DC Pulsed Plasma Excitation power generators from TRUMPF Httinger. DC generators are classics when it comes to DC plasma excitation. Nowadays DC generators are used in numerous applications as an example of cost-effective entry technology into plasma excitation. DC Pulsed Plasma Excitation is ideally suited for use in numerous reactive processes. In contrast to simple direct current generators, pulsed direct current enables the processing of semi and non-conducting materials, such as oxides.

• Defect-free surfaces and high coating rates even in very demanding direct current sputtering processes.
• Integrated water-cooled or air-cooled variants
• Compact design

• Functional Coating using DC magnetron sputtering provides increased surface hardness and static friction
• Better thermal and chemical stability of coated surface
• Used in metallization process for paper-thin metal layer coating of various materials to gain optical or electrical properties
• Coating of Electrically conductive materials (TCO) in photovoltaic cells, touch screens etc.
• Sputter coating of architectural glass

BDISCOM's range of low-medium power RF generators and PLASMA matrix reactors are designed to fulfill most of the R/D and pilot plant applications of Plasma etching and surface activation where the initial machine investment has to be kept very low.

• European manufacture standards at an affordable price.
• Stability and Repeatability.
• LCD touchscreen interface for ease of use.