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Wet Chemical Work Station

Listing ID #3870258

  • Supply Type Manufacturer, Exporter, Supplier
  • Preferred Buyer Location All over the world

Wet Chemical Work Laminar Bench is having class 1000 clean environment inside the workbench, which will be achieved through two-stage filtration of indoor air, via- a set of primary filter bank of 10....
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Company Information

  • Member Since 16 Years
  • Nature of Business Retailer
  • Year of Establishment 2008

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Wet Chemical Work Laminar Bench is having class 1000 clean environment inside the workbench, which will be achieved through two-stage filtration of indoor air, via- a set of primary filter bank of 10 micron rating and a set of final HEPA filter bank of 0. 3 micron rating. The airtight construction of the cabinet ensures no cross contamination or reverse flow of air takes place. The cabinet and structures are made from electro-galvanized iron with polyurethane paint coated finish and inner work area will be covered with 10 mm thick polypropylene materials. This product is applicable for lithography (wet etching using of solvents/acids) and nanotechnology and trace metal lab application etc.


Direction of Flow Vertical Flow (100% Air Exhaust)
Model No BCAD-CWB-222 BCAD-CWB-322 BCAD-CWB-422 BCAD-CWB-622
Working Size in Feet W 2 x D 2 x H 2 W 3 x D 2 x H 2 W 4 x D 2 x H 2 W 6 x D 2 x H 2

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We at BIO-CLEAN AIR DEVICES & SERVICES, we offer best quality quipment & systems which are equal to international standards.all our products are designed & tested as per ISO 14644-1 (International Standard for Clean Room and AssociatedControlled Environment), US Federal Standard 209 E (Federal Standard 209 E for Airborne Particulate CleanlinessClasses one) & IEST-RP-CC-002-2 (Institute of Environment Sciences & Technology) for the approval of all regulatoryagencies such as; NAPL, WHO-GMP & GLP, US-FDA,MHRA from UK, TPD of CANADA, ENVISA of the BRAZIL andTGA of AUSTRALIA.
  • Nature of Business Manufacturer / Exporter / Supplier / Retailer
  • Number of Employees Below 20
  • Year of Establishment 2008
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