V 900, Pvd System, Vertical Sputtering System, BJ2008

V 900 Article number: DV10112 Manufacturer number: V 900 Year of construction: 2008 Condition: Needed Location: Germany Availability: from now on Vertical sputtering system with magnetron sputtering for laboratory systems, V 900Model: V900Year of manufacture: 2008General:The LAB Tool V900 is a vertical sputtering system for laboratory applications. The entire chamber is tilted. The carrier is driven by a bevel gear. The substrates can be transported with or without a carrier. The carrier is guided on the top. In the case without a carrier, the glass rests on rollers. The lower edge of the glass remains at the same level with or without a carrier.The changeover time for changing from one carrier to another should be less than 1 day, including readjustment and commissioning.   The temperature is up to 400°C.In the LL, the glass is heated from the back and cooled from both sides. At PM1 and PM3, the glass is heated from both sides. At the PM2 (cathode), the glass is heated from the back.At the PM, the entire glass moves from left to right and rotates back in front of the cathode during the coating process until the desired layer thickness is reached. The glass is heated during the process to keep the temperature uniform.  The glass bending is +/-3 mm maximum.Basic features:- Modular design based on 2 chamber types Type A: load lock; load bufferType B: process and extension chamber with door for process equipment- Chambers and carriers inclined by 6° (backwards) - A substrate of up to 600 mm × 600 mm (HxL) can be placed on a carrier of 650 mm × 600 mm- Loading/unloading of substrates from the front of the carrier - The substrates are held by gravity (no fasteners)- A spare magnetron position for later extensions- PLC control. A PC is used for data recording- System completely sealed with Viton rings (no rubber or silicone)Module: LLApplication: Load lockTurbopumps: Turbopump TMP-1503LM ISO 250 CE2-point slide valve DN250: 1x pendulum valve type 16.2, DN 250Backing pump: Dry vacuum backing pump SIHI GDV0400S**1K1Module: PMApplication: Extension and processTurbopumps: 2x Turbopump TMP-1503LM ISO 250 CEBacking pump: Dry vacuum backing pump SIHI GDV0400S**1K1Process gas: Ar, Ar/O2, adtl. GasMFC: 4Power supply: SUMMIT 25/25 400/480 PFP YYLug 82AVacuum chambers:Loading station LO- Manual doorLoading lock module LLRectangular chamber made of stainless steel with water channels for cooling the chamber. Internal dimensions: 850 mm × 1200 mm × 280 mm (L × H × D)Chamber wall thickness: approx. 25 mmMaterial: stainless steel DIN 1.4301 (standard hot rolled)- 1 × service door on the front - 1 × HV pump flange DN 250.- 1 × forevacuum pump flange DN 63- 3 × flanges for vacuum gauges and accessories.- 1 × inspection window DN 63 on the top of the chamber.- additional flanges for carrier drive, 2 spare flanges NW40, etc.- 1 × pneumatically operated chamber door Dimensions: 80 × 1000 (W × H) Limit switch for the open/close positionProcess module PM1 to PM3 (PM2 = sputtering)Rectangular chamber made of stainless steel with water channels for chamber cooling. Internal dimensions: 2450 mm × 1200 mm × 280 / 415 mm (L × H × T /D source)Wall thickness of the chamber: approx. 25 mmMaterial: stainless steel DIN 1.4301 (standard hot-rolled)- 1 × process door for two magnetron cathodes (900 mm target length) Tilt drive with motor for cathode service.- 2 × service door on the front- 2 × HV pump flange DN 250- 1 × forevacuum pump flange DN 63- 5 × flanges with window for pyrometer (blind flange) per service door - 4 × flanges for vacuum gauges and accessories.- 3 × viewing opening DN 63 at the top of the chamber.- additional flanges for vent valve, gas inlet, carrier drive, 3 spare flanges NW40, etc.- 5 × set of chamber protection plates with 4 individual plates each- 1 × pneumatically driven gate valve Dimensions: 80 × 1000 (W × H) Limit switch for open/closed positionVacuum pumps and valves- 1 × high vacuum gate valve DN250 ISO-K with pneuma