We manufactured our first thin-film vacuum deposition system over 20 years ago at our u.s. Headquarters in pittsburgh, pa. Hundreds of systems later our proven process equipment division, with engineering, manufacturing, and clean-room assembly areas in the u.s. And u.k., design and manufacture pvd and cvd deposition systems to suit your process application needs.
And we now offer three different computer-controlled atomic layer deposition (ald) system platforms to support varying levels of r&d; from compact, stand-alone ald systems, to fully-integrated multi-technique deposition cluster tools � we have the right platform to support your level of research.
We can develop simple single-chamber bell jar systems for smaller r & d applications to complex multi-chamber computer-controlled cluster tool systems for oledpled production, and everything in-between. Our systems can include a variety of deposition techniques, including magnetron sputtering (rf, dc, and pulsed dc) sources in both linear and circular configurations, ion sources for substrate cleaning and assisted deposition, electron beam evaporation, thermal evaporation for metals and organics, and pulsed laser ablation.

We manufactured our first thin-film vacuum deposition system over 20 years ago at our u.s. Headquarters in pittsburgh, pa. Hundreds of systems later our proven process equipment division, with engineering, manufacturing, and clean-room assembly areas in the u.s. And u.k., design and manufacture pvd and cvd deposition systems to suit your process application needs.
And we now offer three different computer-controlled atomic layer deposition (ald) system platforms to support varying levels of r&d; from compact, stand-alone ald systems, to fully-integrated multi-technique deposition cluster tools � we have the right platform to support your level of research.
We can develop simple single-chamber bell jar systems for smaller r & d applications to complex multi-chamber computer-controlled cluster tool systems for oledpled production, and everything in-between. Our systems can include a variety of deposition techniques, including magnetron sputtering (rf, dc, and pulsed dc) sources in both linear and circular configurations, ion sources for substrate cleaning and assisted deposition, electron beam evaporation, thermal evaporation for metals and organics, and pulsed laser ablation.