TruPlasma radio frequency generators from TRUMPF Hüttinger provide the highest process stability of all power supplies for plasma excitation. The RF technology is therefore especially suited to processes which need the highest level of precision and reproducibility. Also in terms of energy efficiency and robustness, our RF generators are amongst the leaders on the market – they are therefore the first choice for demanding applications such as the manufacture of semi-conductor elements, microchips, solar cells or flat screens.

• Optimal adjustment to process
• Maximum efficiency and Flexibility
• Closed loop control through the measurement of the RF signal directly at the input and output of the matchbox.

Ideal for use in Plasma screen manufacturing, Solar cell Industry and Semi-conductor production in processes such as:

• Reactive Ion Etching (RIE)
• Atomic Layer Deposition (ALD)
• Plasma Enhanced Chemical Vapor Deposition (PECVD)
• RF Sputtering

TruPlasma radio frequency generators from TRUMPF Hüttinger provide the highest process stability of all power supplies for plasma excitation. The RF technology is therefore especially suited to processes which need the highest level of precision and reproducibility. Also in terms of energy efficiency and robustness, our RF generators are amongst the leaders on the market – they are therefore the first choice for demanding applications such as the manufacture of semi-conductor elements, microchips, solar cells or flat screens.

• Optimal adjustment to process
• Maximum efficiency and Flexibility
• Closed loop control through the measurement of the RF signal directly at the input and output of the matchbox.

Ideal for use in Plasma screen manufacturing, Solar cell Industry and Semi-conductor production in processes such as:

• Reactive Ion Etching (RIE)
• Atomic Layer Deposition (ALD)
• Plasma Enhanced Chemical Vapor Deposition (PECVD)
• RF Sputtering