PBN/PG "printed circuit" heaters utilize PBN as an insulating substrate and PG as the resistive element. In non-oxidizing environments, this combination of unique materials delivers performance advantages not available in conventional thermal systems.

• Superior performance in ultra high vacuum.
• Unaffected by most molten metals.
• Operating temperatures to 1500°C and higher.
• Long life, dimensionally and electrically stable.
• Chemically inert to most corrosive gases, liquids.
• High resistance for low cost power supplies.
• Mechanically durable, thermally shock resistant.
• Tailored thermal gradients for specific requirements.
• Ultra-fast response, low thermal mass.
• Power outputs to 35 watts/cm2 (225 watts/in2) and higher.
• Dielectric, fully dense, ceramic surface.
• Often suitable for slightly oxidizing atmospheres.

Potential applications for pyrolytic boron nitride include:

• Compound semiconductor crystal growth
• Wafer processing
• Electronic assembly
• Metallurgical applications
• Thin film manufacturing

PBN/PG "printed circuit" heaters utilize PBN as an insulating substrate and PG as the resistive element. In non-oxidizing environments, this combination of unique materials delivers performance advantages not available in conventional thermal systems.

• Superior performance in ultra high vacuum.
• Unaffected by most molten metals.
• Operating temperatures to 1500°C and higher.
• Long life, dimensionally and electrically stable.
• Chemically inert to most corrosive gases, liquids.
• High resistance for low cost power supplies.
• Mechanically durable, thermally shock resistant.
• Tailored thermal gradients for specific requirements.
• Ultra-fast response, low thermal mass.
• Power outputs to 35 watts/cm2 (225 watts/in2) and higher.
• Dielectric, fully dense, ceramic surface.
• Often suitable for slightly oxidizing atmospheres.

Potential applications for pyrolytic boron nitride include:

• Compound semiconductor crystal growth
• Wafer processing
• Electronic assembly
• Metallurgical applications
• Thin film manufacturing