Listing ID #7312878
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Contact SupplierPROGRAMMABLE SINGLE CHAMBER MAGNETRON SPUTTERING COATER is a single-chamber structure, mainly composed of sputtering vacuum chamber, magnetron sputtering target, ion bombardment, revolution substrate, optical heating system, sputtering power supply, working gas path, vacuum acquisition system, installation machine, vacuum measurement, water cooling, alarm system and control system,etc.
The system is controlled by IPC and PLC, with two modes of automatic and manual control. In addition to put the sample, all other processes are realized on the touch screen. It provides man-machine operation interface such as vacuum system, sputtering process setting, filling and venting system, etc. On the IPC, you can set parameters through the formula, to implement the procedure process and equipment parameter Settings.
Sputtering chamber vacuum limit | ≤8.0×10-6Pa | |
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Vacuum recovery time | The system was pumped from atmosphere to 1.0×10-3 Pa within 15minutes | |
Uniformity | Film thickness nonuniformity≤±5%; nonuniformity between the slices≤±5%; Inhomogeneity between batches≤±5% | |
Sputtering vacuum chamber | The cylindrical structure, size 800mmx250mm | |
Magnetron sputtering system | Permanent magnet target 4, target size 6 inches; One imported power supply (rf or dc pulse optional)ï¼› Sputtering rate: 0.5 ~ 5 angstrom per second (target Al) |
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Revolution base plate | 6 inches 6 pieces (4 inches 12 pieces or 3 inches 16 pieces); The substrate revolution is 3~15 revolution/min, continuously adjustable, and the common rotation composite worktable is optional |
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Light heating system | Sample heating temperature: room temperature to 250 ℃, continuous adjustable; Substrate temperature nonuniformity: ≤±10℃; Temperature control method is PID automatic temperature control and digital display, equipped with imported temperature control meter. |
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Working gas path | 2 way mass flow controller (MFC) | |
Air pump composition | Cryopump (imported), Roots dry pump set, air gate valve (imported), pipes | |
Vacuum measurement | System vacuum, working vacuum and backing vacuum was precisely measured by 2 vacuum gauges (imported); the vacuum degree can be displayed visually on the touch screen of industrial computer; the vacuum degree of the sputtering coating process can be monitored accurately. | |
Control system | The entire system can be controlled by IPC (touch screen) and PLC (imported) | |
Space occupied | Main set | 1500×1000mm2 |
electric control cabinet | 700×700mm2(one) |
Nano Science and Technology Company, founded by Mr Peeyush Dixit in 2013, has been a pioneer as a supplier and importer of multiple electronic and industrial uses chemicals in Gautam Buddha Nagar, Uttar Pradesh India. With a committed commitment to advantage and a customer-centric approach, we have established ourselves as a dependable name in both domestic and corporate sectors.
We recognize the importance of a clean and organized environment, be it at home or in the workplace. Our products are tailored to meet the exclusive requirements of each client, certifying the successful completion of all customer purposes. Whether it's Sputtering Systems, or Education and Research & Development areas, our team of skilled specialists is devoted to delivering top-notch results with efficiency and reliability.
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Vision: Our products must fulfill all the industrial requirements also, renowned for our commitment to excellence, innovation, and sustainability.
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Our service range
We are prominently providing reliable products like Muffle Furnaces, Vacuum Oven, Turbo Molecular Pump Station, Oxygen Plasma Cleaner, Lab Thin Film Coating System, Plasma Sputtering Coater, Thermal Evaporation Coater, Precision Temperature Controlled Hi-Vacuum Thermal Evaporating Coater etc.
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Why us?
Providing reliable and trustworthy products
Equipped with highly knowledgeable staff
Having multiple ranges of products
Transparent pricing structure
Providing online support as well