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    Nst Programmable Single Chamber Magnetron Sputtering Coater

    ₹ 5.50 Lakh - ₹ 12.50 Lakh / piece
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    • MOQ1 Piece
    • Brand NameNST
    • Driven TypeElectric
    • CertificationISO 9001:2015
    • ConditionNew
    • Supply TypeManufacturer, Exporter, Supplier
    • Preferred Buyer Location All over the world
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    Company Information

    location Dadri, Gautam Buddha Nagar, Uttar Pradesh
    View Number
    • calendar Member Since 9 Years
    • building Nature of Business Manufacturer
    • gst icon GST No. 09ARCPD4541L1ZS

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    • Brand NameNST
    • Driven TypeElectric
    • ConditionNew
    • CertificationISO 9001:2015
    • Voltage220V
    • Country of OriginIndia
    • Control SystemThe Entire System Can Be Controlled By Ipc (touch Screen) and PLC (imported)
    • Vacuum Recovery TimeThe System Was Pumped from Atmosphere to 1.0×10-3 Pa Within 15 Minutes
    • Sputtering Vacuum ChamberThe Cylindrical Structure, Size 800mmx250mm
    • Sputtering Chamber Vacuum Limit≤8.0×10-6Pa

    PROGRAMMABLE SINGLE CHAMBER MAGNETRON SPUTTERING COATER is a single-chamber structure, mainly composed of sputtering vacuum chamber, magnetron sputtering target, ion bombardment, revolution substrate, optical heating system, sputtering power supply, working gas path, vacuum acquisition system, installation machine, vacuum measurement, water cooling, alarm system and control system,etc.

     

    The system is controlled by IPC and PLC, with two modes of automatic and manual control. In addition to put the sample, all other processes are realized on the touch screen. It provides man-machine operation interface such as vacuum system, sputtering process setting, filling and venting system, etc. On the IPC, you can set parameters through the formula, to implement the procedure process and equipment parameter Settings.


    Technical Specifications

    Sputtering chamber vacuum limit≤8.0×10-6Pa
    Vacuum recovery timeThe system was pumped from atmosphere to 1.0×10-3 Pa   within 15minutes
    UniformityFilm thickness nonuniformity≤±5%; nonuniformity between the   slices≤±5%; Inhomogeneity between batches≤±5%
    Sputtering vacuum chamberThe cylindrical structure, size 800mmx250mm
    Magnetron sputtering systemPermanent magnet target 4, target size 6 inches;
    One imported power supply (rf or dc pulse optional)ï¼›
    Sputtering rate: 0.5 ~ 5 angstrom per second (target Al)
    Revolution base plate6 inches 6 pieces (4 inches 12 pieces or 3 inches 16 pieces);
    The substrate revolution is 3~15 revolution/min, continuously   adjustable, and the common rotation composite worktable is optional
    Light heating systemSample heating temperature: room temperature to 250 ℃,   continuous adjustable;
    Substrate temperature nonuniformity:   ≤±10℃;
    Temperature control method is PID automatic temperature control   and digital display, equipped with imported temperature control meter.
    Working gas path2 way mass flow controller (MFC)
    Air pump compositionCryopump (imported), Roots dry pump set, air gate valve   (imported), pipes
    Vacuum measurementSystem vacuum, working vacuum and backing vacuum was precisely   measured by 2 vacuum gauges (imported); the vacuum degree can be displayed visually   on the touch screen of industrial computer; the vacuum degree of the    sputtering coating process can be   monitored accurately.
    Control systemThe entire system can be controlled by IPC (touch screen) and   PLC (imported)
    Space occupiedMain set1500×1000mm2
    electric control cabinet700×700mm2(one)





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