NST DESKTOP UV OZONE CLEANER has proven to be highly effective for non-acidic, dry, non-destructive atomic cleaning and removal of organic contaminants using intense 185 nm and 254 nm UV light. Under air and room temperature, the 185 line produces Ozone and while the 254 line excites organic molecules on the surface. This combination drives the rapid destruction and decimation of organic contaminants.

Environment Requirement

• Indoor Use Only; Altitude Use Up To 5,500 Feet;
• Temperature Range 41-104 Degrees Fahrenheit;
• Maximum Relative Humidity 80%, Up To 87 Degrees Fahrenheit Decreasing Linearly to 50% Relative Humidity At 104 Degrees Fahrenheit;
• Main power supply fluctuations not to exceed 10% of the nominal voltage; overvoltage category II;
• Pollution Degree 2; ozone level (ambient) measurement at <45 ppb.

UV   Lamp

• Solid metal double wave mercury lamp
• Wave Length: 253.7nm and 184.9nm
• UV lamp service life: 5000 hrs
• UV light area: 200×200 mm
• Can clean crystal wafer with diameter up to 12“

Chamber & Sample Stage

• Stainless steel case
• Sliding drawer for easy sample loading
• Sample stage area is 310 mm×320 mm (12″×12″ )
• Ozone venting device is built in the chamber
• Timer ranges from 0.01 seconds to 99.9 hours.

Heatable Sample Stage

• Sample stage is heatable up to 150℃ with precision temperature controller
• Temperature controller is 20 segments programmable with +/-2℃ accuracy
• Temperature uniformity:<10℃ within 6 inches diameter area; <20℃ within 12 inches diameter
• Heating rate: 15℃ max.
• The distance between sample stage and lamp is adjustable from 20mm to 40mm.

Vent Port

• 3 in. diameter vent port is built in the back of the machine
• One 10 ft. flexible pipe and one vent clamp are included for connecting the cleaner exhaust to a lab venting system.

Application

• Clean silicon wafer, Gallium Arsenide wafer, quartz and ITO glass
• Clean all types of oxide single crystal substrate such sapphire, STO, and LAO.
• Clean gold and Pt surface
• Oxidizing surface of light metallic material
• Activate Polymers and Crosslink Polymers
• UV Strip Photo Resist / Photoresist
• UV Clean Production Line LED displays

NST DESKTOP UV OZONE CLEANER has proven to be highly effective for non-acidic, dry, non-destructive atomic cleaning and removal of organic contaminants using intense 185 nm and 254 nm UV light. Under air and room temperature, the 185 line produces Ozone and while the 254 line excites organic molecules on the surface. This combination drives the rapid destruction and decimation of organic contaminants.

Environment Requirement

• Indoor Use Only; Altitude Use Up To 5,500 Feet;
• Temperature Range 41-104 Degrees Fahrenheit;
• Maximum Relative Humidity 80%, Up To 87 Degrees Fahrenheit Decreasing Linearly to 50% Relative Humidity At 104 Degrees Fahrenheit;
• Main power supply fluctuations not to exceed 10% of the nominal voltage; overvoltage category II;
• Pollution Degree 2; ozone level (ambient) measurement at <45 ppb.

UV   Lamp

• Solid metal double wave mercury lamp
• Wave Length: 253.7nm and 184.9nm
• UV lamp service life: 5000 hrs
• UV light area: 200×200 mm
• Can clean crystal wafer with diameter up to 12“

Chamber & Sample Stage

• Stainless steel case
• Sliding drawer for easy sample loading
• Sample stage area is 310 mm×320 mm (12″×12″ )
• Ozone venting device is built in the chamber
• Timer ranges from 0.01 seconds to 99.9 hours.

Heatable Sample Stage

• Sample stage is heatable up to 150℃ with precision temperature controller
• Temperature controller is 20 segments programmable with +/-2℃ accuracy
• Temperature uniformity:<10℃ within 6 inches diameter area; <20℃ within 12 inches diameter
• Heating rate: 15℃ max.
• The distance between sample stage and lamp is adjustable from 20mm to 40mm.

Vent Port

• 3 in. diameter vent port is built in the back of the machine
• One 10 ft. flexible pipe and one vent clamp are included for connecting the cleaner exhaust to a lab venting system.

Application

• Clean silicon wafer, Gallium Arsenide wafer, quartz and ITO glass
• Clean all types of oxide single crystal substrate such sapphire, STO, and LAO.
• Clean gold and Pt surface
• Oxidizing surface of light metallic material
• Activate Polymers and Crosslink Polymers
• UV Strip Photo Resist / Photoresist
• UV Clean Production Line LED displays