Hafnium oxide (HfO2) is a sort of wideband hole and high dielectric steady of fired materials. Hafnia is utilized as a part of optical coatings, and as a high-k dielectric in DRAM capacitors, future coordinated circuits, as a hard-headed material… ..Hafnium oxide (HfO2) has been widely examined as a potential contrasting option to silicon dioxide because of its high dielectric consistent and generally high warm dependability as for a silicon surface

Hafnium oxide (HfO2) is a sort of wideband hole and high dielectric steady of fired materials. Hafnia is utilized as a part of optical coatings, and as a high-k dielectric in DRAM capacitors, future coordinated circuits, as a hard-headed material… ..Hafnium oxide (HfO2) has been widely examined as a potential contrasting option to silicon dioxide because of its high dielectric consistent and generally high warm dependability as for a silicon surface