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Multi-processes CVD vacuum furnace, for This vertical

Listing ID #3374411

  • ApplicationThis vertical, multi- layer vacuum coating furnace is meant to deposit silicon carbide coating on the substrate using methyl-try-chloro-silane as reactant and hydrogen as a carrying agent under suitable temperature and pressure
  • Supply Type Manufacturer, Exporter, Supplier
  • Preferred Buyer Location All over the world

To make such composites, a state-of-the-art furnace for Chemical Vapour Deposition Infiltration . This vertical, multi- layer vacuum coating furnace is meant to deposit silicon carbide coating on the substrate using methyl-try-chloro-silane as reactant and hydrogen as a carrying agent under suitable temperature and pressure. With minimum modifications, this CVDCVI vacuum furnace can also be used to deposit a wide range of materials such as boron nitride, hafnium carbide, tantalum carbide , silicon nitride and silicon dioxide
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  • Member Since 7 Years
  • Nature of Business Retailer

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