Listing ID #7311463
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The coating machine has a two-channel high precision mass flow meter. If customers have other requirements, the gas path of up to four-channel mass flow meter can be customized to meet the complex gas environment requirements. The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
Single target magnetron sputtering coater application:
This device can be used for preparing single-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the single target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
| Sample stage | Size | φ185mm | Temperature control accuracy | ±1℃ |
|---|---|---|---|---|
| Heating temperature | Max 500℃ | Rotate speed | 1-20rpm adjustable | |
| Magnetron Sputtering target head | Quantity | 2”×1 (1”,2”,3”, 4”optional) | Water chiller | Circulating water chiller with flow rate of 10L/min |
| Cooling mode | Water cooling | |||
| Vacuum chamber | Chamber size | φ300mm×300mm | Watch window | φ100mm |
| Chamber material | Stainless steel | Opening mode | Top cover open | |
| Mass flowmeter | 2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs) | |||
| Vacuum system | Model | NST-GZK103-A | Pumping interface | KF40 |
| Molecular pump | NST-600 | Exhaust interface | KF16 | |
| Backing pump | rotary vane pump | Vacuum measurement | Compound vacuum gauge | |
| Ultimate vacuum | 1.0E-5Pa | Power supply | AC;220V 50/60Hz | |
| Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes | |||
| Power configuration | Quantity | NST power supply×1 | Max output power | 1500W |
| Other parameters | Supply voltage | AC220V,50Hz | Overall size | 600mm×650mm×1280mm |
| Total power | 3KW | Total Weight | 300kg | |
Nano Science and Technology Company, founded by Mr Peeyush Dixit in 2013, has been a pioneer as a supplier and importer of multiple electronic and industrial uses chemicals in Gautam Buddha Nagar, Uttar Pradesh India. With a committed commitment to advantage and a customer-centric approach, we have established ourselves as a dependable name in both domestic and corporate sectors.
We recognize the importance of a clean and organized environment, be it at home or in the workplace. Our products are tailored to meet the exclusive requirements of each client, certifying the successful completion of all customer purposes. Whether it's Sputtering Systems, or Education and Research & Development areas, our team of skilled specialists is devoted to delivering top-notch results with efficiency and reliability.
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Vision: Our products must fulfill all the industrial requirements also, renowned for our commitment to excellence, innovation, and sustainability.
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Our service range
We are prominently providing reliable products like Muffle Furnaces, Vacuum Oven, Turbo Molecular Pump Station, Oxygen Plasma Cleaner, Lab Thin Film Coating System, Plasma Sputtering Coater, Thermal Evaporation Coater, Precision Temperature Controlled Hi-Vacuum Thermal Evaporating Coater etc.
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Why us?
Providing reliable and trustworthy products
Equipped with highly knowledgeable staff
Having multiple ranges of products
Transparent pricing structure
Providing online support as well
Nature of Business
Manufacturer / Exporter / Supplier
Number of Employees
20 - 50
Year of Establishment
2013
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