Anti-Corrosion Spin Coater ( 8000 RPM & 6″ wafer Max.) with Complete Accessories

Structure

• Case and spin disk made of Polypropylene (PP) to resist most of the corrosive solutions.
• Digital control box is separated from spin coater.
• One filter is included in standard package. It is used to connect the pump and coater for preventing waste water from flowing into the pump.

Input Power

• Default 220VAC, 50/60Hz,   single phase, 1000W Max.
• 110V is available in optional bar ( with 1500W transformer )
• A power socket on the back of the Digital control box is used to supply power to the vacuum pump. (The output voltage of this power outlet depends on the input voltage of the spin coater, e.g. if the spin coater is plugged into AC 110V, this power socket will supply AC 110V.)

Chamber  & Vacuum Chuck

• Chamber diameter:  150 mm
• PP anti-corrosive vacuum chuck Φ100mm, which can hold substrate upto 6″ Dia.
• If your sample < 10 mm, please order rubber cup from us at extra cost

Vacuum Pump

• One 120L/min Oilless Vacuum Pump is included in the standard package, please click the picture below for specification details.
• For Ar glove box user, we recommend our 24VDC vacuum pump for simple pump and coater connection with no feedthrough required.

Spin Speed

• Digital control panel with six programmable segments of different spin times and speeds
• Maximum programmable spin time 6*60s = 360s
• 500 – 8000 RPM adjustable spinning speed  at each segment

Liquid Injecting

20mL syringe is used to contain the coating material

Optional

• You may choose Precision Electronic Single Channel Pipette: 20 – 200uL for more accurate coating
• Using plasma cleaner to treat substrate surface before coating can improve film quality
• Heating cover with digital temperature controller up to 120 is available upon request at extra cost ($1950), which allow sample drying in-situ during and after coating
• Vacuumable spin coater with digital gauge is available

Warranty

• One year limited with lifetime support.
• Rusting and damage due to improper storage condition or maintenance are not covered by warranty

This product is a small vacuum arc melting furnace with tungsten electrodes and water-cooled copper crucible. The equipment melting temperature can exceed 3000, and the temperature is reduced rapidly. The equipment adopts stainless steel water-cooled chamber and is equipped with a quartz observation window to observe the sample melting condition, which is very suitable for sample melting and heat treatment, phase diagram research. During smelting, the metal is placed in the water-cooled copper crucible. According to the process requirements, the furnace can be filled with high-purity inert protective gas, and the high-temperature plasma generated by the arc is used to melt the metal. Multi-station copper crucible can be used for a variety of small metal (about 3g 5g per station) smelting in sequence, with the side control lever for tilting and rotating metal ingots after smelting. There is a larger cavity in the middle of the copper crucible for mixed smelting of the alloy (which can hold about 25g). The smelting furnace is also equipped with a vacuum suction casting mold. The user can replace and install it by simple tools. After replacement, the vacuum suction casting function can be realized. The cylindrical metal sample can be made to facilitate subsequent cutting, clamping and analysis operations.

Vacuum arc melting furnace features:

The device has the advantages of small size, stable performance, simple operation, comprehensive functions and convenient use, and is very suitable for laboratory research on small doses of metal samples.

Crucible

• Water-cooled copper crucible with 7 cavities, 6 cavities φ25mm×8mm, the large working cavity φ40mm×12mm can be used for mixed smelting alloy.
• Vacuum suction casting mold crucible, φ13mm×33mm.

LAB COMPACT UV-OZONE CLEANER WITH 6″×6″ CHAMBER

Lab compact UV-ozone cleaner’s cleaning effect is caused by irradiating the surface of a substrate with suitable lamps creating enough energy in the in the Ultra Violet spectrum range. It is photo-sensitized oxidation process by atomized Oxygen and high reactive Ozone. The UV radiation directly to the surface stimulates the reaction. Volatile hydrocarbon products are produced. The removal of hydrocarbons in nanometer thickness by oxidation results in ultra clean surfaces with significantly wettability. This is very important before thin film coating process of glass and ceramic surfaces.

Lab compact UV-ozone cleaner main features:

• To remove a variety of contaminants from surfaces of substrates samples.
• Use the dry process to clean surfaces with the highly effective method.
• Generate energy at wave line between 254nm to 185nm.
• There are Oxygen inlet port, Ozone removal pump, and LCD display unit.
• Sample temperature measurement feature.
• Buzzer for indicating completion of cleaning.
• Locking feature for locking sample feeding tray to avoid opening during operation.

UV Lamp

• UV lamp power: 120W Max.
• Wave length: 254 nm and 185 nm
• Max substrate size: 150×150 mm (6″×6″)

Chamber & Sample Stage

• Tray size: 176mm×168mm
• Sample feeding: slide based

Applications:

• Cleaning molecular contamination from SPTs, AFM tips, and surfaces
• Curing UV-adhesives
• UV-photopatterning of SAM surfaces
• Oxidizing PDMS
• Surface sterilization
• Etch, pattern, sharpen
• Clean MEMS devices
• Clean substrate surfaces such as Si, Ge, GaAs and all oxide crystal  substrate

ULTRA-LOW TEMPERATURE ATMOSPHERIC PLASMA CLEANER utilizes the characteristics of plasma to clean, revitalite and activate the surface of solid materials that need to be treated, and the atmospheric plasma cleaner improves the surface adhesion, thereby achieving the purpose of changing the surface microstructure, chemical properties and energy.   Plasma – the fourth state of the material that is not mysterious!   There are solid, liquid, and gaseous substances that we are very familiar with in nature. By continuously providing energy to the substance, the temperature of the substance will rise, and the state of the substance will also be from “solid state→liquid state”, “liquid state→gaseous state”, “gaseous state→plasma state”.   The substance is made up of atoms, which consist of a positively charged nucleus and a negatively charged electron that surrounds the nucleus. When the energy is continuously supplied and heated to a sufficiently high temperature, the outer electrons are detached from the nucleus and become free electrons. This process is called “ionization”; and the substance becomes a positively charged nucleus and a negatively charged electron. Of course, there are also active groups, excited states of nuclides (meta-stable), photons, etc., which are a uniform “paste”, so the plasma is also called plasma. In plasma, the total amount of positive and negative charges is equal, so the overall is electrically neutral, called plasma.   Plasma is a state of high energy instability. Utilizing this high energy and unstable state, plasma has a variety of applications.   Ultra-low temperature atmospheric plasma cleaner principle: Etching on the surface of the material – physical effect A large number of active particles in the plasma, such as a large number of ions, excited molecules, and free radicals, act on the surface of the solid sample, which not only removes the original contaminants and impurities, but also produces an etching effect to roughen the surface of the sample and form many fine pits, which increases the specific surface of the sample, improves the wetting properties of solid surfaces.   Activation bond energy, cross-linking The energy of the particles in the plasma is between 0 and 20 eV, and most of the bond energy in the polymer are between 0 and 10 eV. Therefore, after the plasma acts on the solid surface, the original chemical bond on the solid surface can be broken. Free radicals in the plasma form a network of crosslinked structures with these bonds, greatly activating surface activity.   Formation of new functional groups – chemical action If a reactive gas is introduced into the electric discharge gas, a complicated chemical reaction occurs on the surface of the activated material, and new functional groups such as hydrocarbonyl, amidogen, carboxyl group, and the like are introduced, and these functional groups are all active groups, which can significantly improve the surface activity of the material.   Ultra-low temperature atmospheric plasma cleaner structure: Plasma cleaner is mainly composed of two parts: First, the plasma generator is composed of integrated circuit, operation control, plasma generating power source, gas source processing, and safety protection. Second, the plasma processing apparatus is composed of an excitation electrode, an excitation gas path, and the like.   Ultra-low temperature atmospheric plasma cleaner technical advantages: German circuit technology: It adopts German high-voltage excitation power circuit technology to generate high-density plasma and ensure superior cleaning results.   Comprehensive security protection: Over temperature, overload, abnormal air pressure, short circuit, wrong operation, and other comprehensive alarm protection.   Patented discharge technology: Special treatment and special structure of the discharge device, leading atmospheric glow discharge technology.   Great processing width: Solve the problem of large-width sample cleaning, up to 2

NST DESKTOP UV OZONE CLEANER has proven to be highly effective for non-acidic, dry, non-destructive atomic cleaning and removal of organic contaminants using intense 185 nm and 254 nm UV light. Under air and room temperature, the 185 line produces Ozone and while the 254 line excites organic molecules on the surface. This combination drives the rapid destruction and decimation of organic contaminants.

Environment Requirement

• Indoor Use Only; Altitude Use Up To 5, 500 Feet;
• Temperature Range 41-104 Degrees Fahrenheit;
• Maximum Relative Humidity 80%, Up To 87 Degrees Fahrenheit Decreasing Linearly to 50% Relative Humidity At 104 Degrees Fahrenheit;
• Main power supply fluctuations not to exceed 10% of the nominal voltage; overvoltage category II;
• Pollution Degree 2; ozone level (ambient) measurement at <45 ppb.

UV   Lamp

• Solid metal double wave mercury lamp
• Wave Length: 253.7nm and 184.9nm
• UV lamp service life: 5000 hrs
• UV light area: 200×200 mm
• Can clean crystal wafer with diameter up to 12“

Chamber & Sample Stage

• Stainless steel case
• Sliding drawer for easy sample loading
• Sample stage area is 310 mm×320 mm (12″×12″ )
• Ozone venting device is built in the chamber
• Timer ranges from 0.01 seconds to 99.9 hours.

Heatable Sample Stage

• Sample stage is heatable up to 150 with precision temperature controller
• Temperature controller is 20 segments programmable with +/-2 accuracy
• Temperature uniformity:<10 within 6 inches diameter area; <20 within 12 inches diameter
• Heating rate: 15 max.
• The distance between sample stage and lamp is adjustable from 20mm to 40mm.

Vent Port

• 3 in. diameter vent port is built in the back of the machine
• One 10 ft. flexible pipe and one vent clamp are included for connecting the cleaner exhaust to a lab venting system.

Application

• Clean silicon wafer, Gallium Arsenide wafer, quartz and ITO glass
• Clean all types of oxide single crystal substrate such sapphire, STO, and LAO.
• Clean gold and Pt surface
• Oxidizing surface of light metallic material
• Activate Polymers and Crosslink Polymers
• UV Strip Photo Resist / Photoresist
• UV Clean Production Line LED displays

NST-3″ TWO ZONES CSS FURNACE is heated by two group of halogen heaters (Top and Bottom) separately with max. 20ºC/s heating rate. Two 30 segment precision temperature controllers are built in with +/-1ºC accuracy. RS485 port and control software are included to allow for the operation of furnace and temperature profile logging via PC. It is excellent tool to research new generation thin film for solar cells, such as CdTe, Sulfide, and Perovskite solar cell.

TWO ZONES CSS FURNACE WITH ROTATING WAFER HOLDER is heated by two group of halogen heaters (Top and Bottom) separately with max. 10ºC/s heating rate. The top sample holder is rotatable to achieve high uniformity coating. It is an excellent tool to research new generation thin film for solar cells, such as CdTe, Sulfide, and Perovskite solar cell.

FOUR SOURCES THERMAL EVAPORATION SYSTEM is suitable for coating most of metallic and organic materials film up to 2″ size from 200 ºC to 1500 ºC (or 200 ºC – 1700 ºC with an optional B-type thermocouple).The sample stage can be rotated to obtain a more uniform film.The evaporating system is small in size, which can effectively save laboratory space; it is easy to operate and has strong adaptability to different materials, so it is widely used in the laboratories of universities and research institutes.

• 280 mm O.D.×260 mm I.D.×310 mm Height quartz chamber for easy cleaning and sample loading
• 2″ Dia rotatable evaporating sources for the uniform film coating
• Tungsten coil heater and alumina crucible for high-temperature coating up to 1700 ºC
• Precision temperature control with 30 programmable segments and +/- 1 ºC accuracy
• High vacuum can be achieved up to 1.0E-5 Torr via optional turbopump
• Gas flow port and valve are built in for chamber purge and CVD possibility

DUAL CHAMBER PULSE LASER COATER is used for growing optical crystals, ferroelectrics, ferromagnets, superconductors and organic compound thin film materials, suitable for growing high melting point, multi-elements and complex layered superlattice thin film materials containing gas elements. It is widely used in the research and manufacture of thin film materials in colleges and universities.

COMPACT POWDER NST COATING SYSTEM is a small powder coating system consisting mainly of a 2-inch magnetron sputtering head and a vibrating sample stage. The powder is vibrated on the vibrating sample stage, and is coated on the surface of the powder by sputtering to form a core-shell structure. NST magnetron sputtering is suitable for metallic materials on powder surfaces. NST magnetron sputtering is suitable for coating non-metallic materials or carbon on the surface of materials.

Compact UV-Ozone Cleaner proven to be highly effective for non-acidic, dry, non-destructive atomic cleaning and removal of organic contaminants using intense 185 nm and 254 nm UV light. Under air and room temperature, the 185 line produces Ozone and while the 254 line excites organic molecules on the surface. This combination drives the rapid destruction and decimation of organic contaminants.

UV Lamp

• Solid metal double wave mercury lamp
• UV lamp power: 55W Max.
• Wave length: 254 nm and 185 nm
• UV Lamp service life: 2500 hrs
• UV light area: 100×100 mm ( 4″×4″)
• Peak UV intensities: 4.6 milliwatts/cm2.

Chamber & Sample Stage

• Overall Dimensions:   9 1⁄2” ×7 7/8” ×6”
• Drawer Dimensions:133mm×133mm×25mm
• Distance from drawer to lamp: 27mm
• Distance from pedestal to lamp: 8mm
• Borosilicate Glass Pedestal:  4”×4”×3⁄4”
• 18 Gauge Steel Chassis and Cover, Powder Coated Finish
• Total Weight: 9 lbs.

Environmental Requirement

• Indoor Use Only; Altitude Use Up To 5, 562 Feet;
• Temperature Range 41-104 Degrees Fahrenheit;
• Maximum Relative Humidity 80%, Up To 87 Degrees Fahrenheit Decreasing Linearly to 50% Relative Humidity At 104 Degrees Fahrenheit;
• Main Power Supply Fluctuations Not To Exceed 10% Of The Nominal Voltage; Overvoltage Category II;
• Pollution Degree 2; ozone level (ambient) measurement at <45 ppb.

Application:

• Cleaning molecular contamination from SPTs, AFM tips, and surfaces
• Curing UV-adhesives
• UV-photopatterning of SAM surfaces
• Oxidizing PDMS
• Surface sterilization
• Etch, pattern, sharpen
• Clean MEMS devices
• Clean substrate surfaces such as Si, Ge, GaAs and all oxide crystal  substrate

PLASMA CLEANER, also known as plasma surface treatment device, is a new high-tech technology that uses plasma to achieve the results that conventional cleaning methods cannot achieve. Plasma is a state of matter, also called the fourth state of matter, and does not belong to the common three-state of solid-liquid-gas. Applying enough energy to the gas to ionize it becomes a plasma state. The “active” components of the plasma include: ions, electrons, atoms, active groups, excited states of nuclides (metastasis), photons, and the like. Plasma cleaner is to treat the surface of the sample by utilizing the properties of these active components, thereby achieving the purpose of cleaning, coating, etc., improving the surface adhesion of the product, and facilitating the bonding, spraying, printing and sealing of the product.

Low processing temperature

The processing temperature can be as low as 80 and below 50 . Low processing temperatures ensure no thermal effects on the sample surface.

No pollution during the whole process

The plasma cleaner itself is a very environmentally friendly device that does not cause any pollution and does not cause any pollution during the treatment process. It can be combined with the original production line to achieve fully automatic online production, saving labor costs.

Stable treatment effect

The treatment effect of plasma cleaning is very uniform and stable, and the conventional sample maintains good effect for a long time after treatment.

70mm rotary spray gun plasma cleaner product principle:

The structure of the plasma cleaner is mainly divided into three major components, namely high-voltage excitation power supply, plasma generator spray gun, and control system.

High-voltage excitation power supply:

The generation of plasma requires high-voltage excitation, and the atmospheric low-temperature plasma is excited by an intermediate frequency power supply at a frequency of 10-40 kHz. The high voltage is at 4-10KV. The parameters can be adjusted according to the actual conditions of the sample, and the optimal modification effect has been achieved.

Plasma generator spray gun:

The atmospheric low-temperature plasma generator spray gun can be divided into two types: jet flow direct injection and rotary direct injection, the difference is that the treatment area is different.

Control system:

The control system functions is to control the operation of the entire atmospheric low temperature plasma cleaning equipment and the protection of the overall system.

PLASMA CLEANING MACHINE EQUIPMENT PRINCIPLE:

ETCHING ON THE SURFACE OF THE MATERIAL – PHYSICAL EFFECT

A large number of active particles in the plasma, such as a large number of ions, excited molecules, and free radicals, act on the surface of the solid sample, which not only removes the original contaminants and impurities, but also produces an etching effect to roughen the surface of the sample and form many fine pits, which increases the specific surface of the sample, improves the wetting properties of solid surfaces.

Activation bond energy, cross-linking

The energy of the particles in the plasma is between 0 and 20 eV, and most of the bond energy in the polymer are between 0 and 10 eV. Therefore, after the plasma acts on the solid surface, the original chemical bond on the solid surface can be broken. Free radicals in the plasma form a network of crosslinked structures with these bonds, greatly activating surface activity.

Formation of new functional groups – chemical action

If a reactive gas is introduced into the electric discharge gas, a complicated chemical reaction occurs on the surface of the activated material, and new functional groups such as hydrocarbonyl, amidogen, carboxyl group, and the like are introduced, and these functional groups are all active groups, which can significantly improve the surface activity of the material.

NST 27L512L Lithium Battery Electrode Vacuum Degassing Baking Oven

1 The NST-DZF-6210 Vacuum Degassing Oven is a larger volume designed vacuum oven for industrial use. It has a 200 litres about 7.5 cubic feet volume.

2 The NST-DZF-6210 Vacuum Degassing Oven for lithium battery field mainly used for lithium battery materials, electrode and battery core vacuum drying for production line.

3 Use Vacuum Oven for material heating drying under vacuum states has advantages:

1 Can reduce the drying temperature

2 Avoid some objects heating to oxidation

3 Avoid heating air to kill living cells

4 No dust damage

ATMOSPHERIC PLASMA SURFACE TREATMENT INSTRUMENT is an excellent tool for cleaning wafer surface before epitaxial or optical fiber before welding to obtain higher quality. This device also may be used for studying atmosphere pressure CVD.

Atmospheric plasma surface treatment instrument main features:

• High speed surface treatment with simple and safe operation
• Neither vacuum  nor chamber required with versatile plasma chemistry
• Handheld or in-line processing at low cost
• Light weight and compact size

Warranty & Certificate

• One year limited with lifetime support
• CE certified

Application Notes

• This Atmospheric Plasma Jet-Flow system is excellent to clean plastic, polymer and oxide substrate surface before coating
• This device also may be used for studying atmospheric pressure CVD.

NST-100-400°C CONVECTION DRYING OVEN WITH DIGITAL TEMPERATURE CONTROLLER

Structure

• Use mirror stainless steel tank, four and a half circular arc transition, clapboard stents can free loading and unloading, easy to clean.
• Adopt PID fuzzy logic controller, quickly reached set Tem, more accurate and stable.
• Configuration independent limit temperature alarm system, exceed limit temperature automatically interrupted, security.
• Diameter of 50 mm hole is on the box left, easy to operation and measuring temperature.

NST-110E Turbo Pumping Station

PLASMA CLEANER 5L

Featrues:

• Environmental technologies: plasma process is the role of gas – solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
• Wide adaptability: regardless of processing substrate type, such as metals, semiconductors, oxides, and most.

Applications

• Car industry: ignition coil engine oil seal film
• Defense industry: Aerospace electrical connectors, Kevlar deal
• Electronics industry: hard plastic parts, earphone, Cell phone cover
• Medical industry: intravenous infusion, catheter treatment
• Textile fiber, rubber and plastic industry and etc.

THE VACUUM ATMOSPHERE LIFTING FURNACE FOR SILICON CARBIDE HEATING ELEMENTS, USES the three layers of shell structure and the Japanese island of 40 program temperature control system, electric phase-shifting trigger, thyristor control, furnace using 1600 type of polycrystal alumina fibre materials imported from Japan, between the furnace shell is equipped with air cooling system, can rise quickly cooling, &energy-saving equilibrium temperature field, low surface temperature and elevating temperature rate quickly, the advantages of energy saving, convenient take material, don’t need a crucible tongs stretch into the furnace, suitable for high temperature material taking and vacuum sintering in high temperature annealing is colleges and universities, research institutes, industrial and mining enterprises do powder sintering, ceramic sintering, glass melting, high temperature experiment, the ideal product quality inspection.

30-920L 300°C Max. Convection Oven with Programmable Temperature Controller

Tmax-DSP is a 300°C Max. Ovens combine forced-air circulation and programmable temperature controller to achieve dependable, uniform furnace for a variety of laboratory applications like drying, storing, annealing. It is an ideal heating equipment for material R&D laboratories.

NST BASED HIGH VACUUM PUMPING SYSTEM are used in both laboratory and industrial applications. The standard Vacuum Pumping Systems consists of Rotary Vacuum Pump, Diffusion pumps and other hardware like valves, baffles, collar, gauge and plumbing lines etc., fully integrated and wired. Special Vacuum Pumping Systems are offered with Rotary Pumps, Root Pumps & Diffusion pumps or combination as per customer requirements, Auto Manual Valves, Modular Structure etc The Vacuum Pumping Systems, are trolley mounted with castor wheel for easy movement, and are capable of achieving an ultimate vacuum of 10-6 m.bar. Liquid nitrogen trap given as optional is to minimize the back-streaming of oil vapors, and ensures clean and better ultimate vacuum of 10-6m.bar range. The vacuum pumping systems are fitted with Pirani Gauge to measure the roughing and backing vacuum & Penning gauge for measuring the high vacuum. Option is available for Digital & Analogue type of gauges.

Features:

• All components easily accessible
• Compact construction
• Simple operation
• Allows direct connection of Vacuum Chamber
• Pumping speed ranging from 120 lps to 3000 lps
• Ultimate (Unbaffled) vacuum better than 10-6 m bar (with LNT)
• D.P., baffles, valves, collar & plumbing are S.S. construction Optional      Optional accessories
• Liquid Nitrogen Trap given as optional.
• Water Cooled Chevron Baffle given as optional.
• Electro pneumatically operated valve. (Butterfly valve, Rightangle Valve)
• Push buttons, automatic versions are available on request

The equipment features and the main purpose

Basic principles and uses In the case of vacuum or atmosphere protection of the material for non-polluting heat treatment equipment can be nitrogen argon hydrogen and other atmosphere sintering.  Mainly used in high temperature atmosphere sintering high temperature vacuum sintering transparent ceramics and other materials sintering.

The structure of the composition

Furnace body furnace lid bottom vacuum system control system cooling system heating body and insulation screen.

The structure that

• The furnace vertical shell its inner and outer are made of 304 stainless steel cylinder the outer mirror polished.  Inside and outside the tube and the front and rear flange welded into a whole the furnace body with electrode holes suction holes vent holes thermocouple holes infrared holes and observation holes the interface materials are stainless steel.
• The lid from inside and outside the head and flange welding the middle of the water can be cooled the lid open device.
• The bottom the inside and outside the head and flange composition the middle of the water cooling the lower part of the filling and discharging holes fixed in the lower part of the furnace with electrode extraction device.
• Heating body and insulation screen heating elements made of high purity film effectively increase the radiation area to ensure uniformity of the temperature zone.  The bottom of the insulation screen with a tungsten plate the other using the template and stainless steel plate production.
• The vacuum system mainly by the direct pump molecular pump or diffusion pump pneumatic baffle valve pneumatic shut-off valve digital composite vacuum gauge vacuum pipe bleed valve bracket and other components; vacuum pipe and pump between  Metal corrugated hose quick connector connection (slow vibration).

The control system

A computer automatic control system (optional)

• Automatic PLC flat panel touch computer control (XP) system you can manually switch automatically.  Features are as follows
• The control system software is developed by our company man-machine interface operating system picture-friendly simple operation fast running real-time monitoring of the furnace conditions the system is stable and reliable.
• Software color simulation screen display industrial grade Tablet PC fast response anti-interference ability temperature display and vacuum valve control are integrated analog screen operation.
• The device can adopt the temperature curve power curve vacuum curve water temperature curve air pressure curve and sintering time curve user-friendly analysis based on historical curve sintering process.  Data can automatically generate excel file through the usb interface test.
• The temperature control method for the following thermocouple 1700 temperature control more than 1700 infrared instrument automatic control high and low temperature automatic conversion.
• Communication interface such as RS232 RS422 CAN LAN USB etc. easy and other equipment networking applications.  Software control interface visualization can dynamically display the workflow convenient and intuitive.
• The software free upgrade for life.

Standard configuration manual instrument automatic temperature control 1700 below the thermocouple temperature control more than 1700 infrared instrument automatic control high and low temperature automatic conversion.

Water cooling system the furnace the upper and lower end of the cover with water-cooled structure of the form in and out of the water main pipe installed on the hydraulic relay and pressure gauge while the control cabinet connected to the abnormal state alarm.  Can qualitatively observe the water flow size of each waterway.  The entire water cooling system to ensure.

Advantages

• Scraping system, parts processing precision, slurry contact part stainless steel structure, scraping thickness adjustable.
• Main transmission adopts frequency control of motor speed, wide speed range speed constant and reliable for the speed control system, constant torque
• Drying box adopts far infrared heating pipe, high heat efficiency, long service life
• Using hot air circulation system, can make the temperature uniform, not easy to burn the pole piece
• Temperature control adopts PID control system, high control accuracy, reliable work
• The reeling adopts automatic correction system, pole piece coiling system

Anti-Corrosion Spin Coater ( 8000 RPM & 6″ wafer Max.) with Complete Accessories

Structure

• Case and spin disk made of Polypropylene (PP) to resist most of the corrosive solutions.
• Digital control box is separated from spin coater.
• One filter is included in standard package. It is used to connect the pump and coater for preventing waste water from flowing into the pump.

Input Power

• Default 220VAC, 50/60Hz,   single phase, 1000W Max.
• 110V is available in optional bar ( with 1500W transformer )
• A power socket on the back of the Digital control box is used to supply power to the vacuum pump. (The output voltage of this power outlet depends on the input voltage of the spin coater, e.g. if the spin coater is plugged into AC 110V, this power socket will supply AC 110V.)

Chamber  & Vacuum Chuck

• Chamber diameter:  150 mm
• PP anti-corrosive vacuum chuck Φ100mm, which can hold substrate upto 6″ Dia.
• If your sample < 10 mm, please order rubber cup from us at extra cost

Vacuum Pump

• One 120L/min Oilless Vacuum Pump is included in the standard package, please click the picture below for specification details.
• For Ar glove box user, we recommend our 24VDC vacuum pump for simple pump and coater connection with no feedthrough required.

Spin Speed

• Digital control panel with six programmable segments of different spin times and speeds
• Maximum programmable spin time 6*60s = 360s
• 500 – 8000 RPM adjustable spinning speed  at each segment

Liquid Injecting

20mL syringe is used to contain the coating material

Optional

• You may choose Precision Electronic Single Channel Pipette: 20 – 200uL for more accurate coating
• Using plasma cleaner to treat substrate surface before coating can improve film quality
• Heating cover with digital temperature controller up to 120 is available upon request at extra cost ($1950), which allow sample drying in-situ during and after coating
• Vacuumable spin coater with digital gauge is available

Warranty

• One year limited with lifetime support.
• Rusting and damage due to improper storage condition or maintenance are not covered by warranty

This product is a small vacuum arc melting furnace with tungsten electrodes and water-cooled copper crucible. The equipment melting temperature can exceed 3000, and the temperature is reduced rapidly. The equipment adopts stainless steel water-cooled chamber and is equipped with a quartz observation window to observe the sample melting condition, which is very suitable for sample melting and heat treatment, phase diagram research. During smelting, the metal is placed in the water-cooled copper crucible. According to the process requirements, the furnace can be filled with high-purity inert protective gas, and the high-temperature plasma generated by the arc is used to melt the metal. Multi-station copper crucible can be used for a variety of small metal (about 3g 5g per station) smelting in sequence, with the side control lever for tilting and rotating metal ingots after smelting. There is a larger cavity in the middle of the copper crucible for mixed smelting of the alloy (which can hold about 25g). The smelting furnace is also equipped with a vacuum suction casting mold. The user can replace and install it by simple tools. After replacement, the vacuum suction casting function can be realized. The cylindrical metal sample can be made to facilitate subsequent cutting, clamping and analysis operations.

Vacuum arc melting furnace features:

The device has the advantages of small size, stable performance, simple operation, comprehensive functions and convenient use, and is very suitable for laboratory research on small doses of metal samples.

Crucible

• Water-cooled copper crucible with 7 cavities, 6 cavities φ25mm×8mm, the large working cavity φ40mm×12mm can be used for mixed smelting alloy.
• Vacuum suction casting mold crucible, φ13mm×33mm.

LAB COMPACT UV-OZONE CLEANER WITH 6″×6″ CHAMBER

Lab compact UV-ozone cleaner’s cleaning effect is caused by irradiating the surface of a substrate with suitable lamps creating enough energy in the in the Ultra Violet spectrum range. It is photo-sensitized oxidation process by atomized Oxygen and high reactive Ozone. The UV radiation directly to the surface stimulates the reaction. Volatile hydrocarbon products are produced. The removal of hydrocarbons in nanometer thickness by oxidation results in ultra clean surfaces with significantly wettability. This is very important before thin film coating process of glass and ceramic surfaces.

Lab compact UV-ozone cleaner main features:

• To remove a variety of contaminants from surfaces of substrates samples.
• Use the dry process to clean surfaces with the highly effective method.
• Generate energy at wave line between 254nm to 185nm.
• There are Oxygen inlet port, Ozone removal pump, and LCD display unit.
• Sample temperature measurement feature.
• Buzzer for indicating completion of cleaning.
• Locking feature for locking sample feeding tray to avoid opening during operation.

UV Lamp

• UV lamp power: 120W Max.
• Wave length: 254 nm and 185 nm
• Max substrate size: 150×150 mm (6″×6″)

Chamber & Sample Stage

• Tray size: 176mm×168mm
• Sample feeding: slide based

Applications:

• Cleaning molecular contamination from SPTs, AFM tips, and surfaces
• Curing UV-adhesives
• UV-photopatterning of SAM surfaces
• Oxidizing PDMS
• Surface sterilization
• Etch, pattern, sharpen
• Clean MEMS devices
• Clean substrate surfaces such as Si, Ge, GaAs and all oxide crystal  substrate

ULTRA-LOW TEMPERATURE ATMOSPHERIC PLASMA CLEANER utilizes the characteristics of plasma to clean, revitalite and activate the surface of solid materials that need to be treated, and the atmospheric plasma cleaner improves the surface adhesion, thereby achieving the purpose of changing the surface microstructure, chemical properties and energy.   Plasma – the fourth state of the material that is not mysterious!   There are solid, liquid, and gaseous substances that we are very familiar with in nature. By continuously providing energy to the substance, the temperature of the substance will rise, and the state of the substance will also be from “solid state→liquid state”, “liquid state→gaseous state”, “gaseous state→plasma state”.   The substance is made up of atoms, which consist of a positively charged nucleus and a negatively charged electron that surrounds the nucleus. When the energy is continuously supplied and heated to a sufficiently high temperature, the outer electrons are detached from the nucleus and become free electrons. This process is called “ionization”; and the substance becomes a positively charged nucleus and a negatively charged electron. Of course, there are also active groups, excited states of nuclides (meta-stable), photons, etc., which are a uniform “paste”, so the plasma is also called plasma. In plasma, the total amount of positive and negative charges is equal, so the overall is electrically neutral, called plasma.   Plasma is a state of high energy instability. Utilizing this high energy and unstable state, plasma has a variety of applications.   Ultra-low temperature atmospheric plasma cleaner principle: Etching on the surface of the material – physical effect A large number of active particles in the plasma, such as a large number of ions, excited molecules, and free radicals, act on the surface of the solid sample, which not only removes the original contaminants and impurities, but also produces an etching effect to roughen the surface of the sample and form many fine pits, which increases the specific surface of the sample, improves the wetting properties of solid surfaces.   Activation bond energy, cross-linking The energy of the particles in the plasma is between 0 and 20 eV, and most of the bond energy in the polymer are between 0 and 10 eV. Therefore, after the plasma acts on the solid surface, the original chemical bond on the solid surface can be broken. Free radicals in the plasma form a network of crosslinked structures with these bonds, greatly activating surface activity.   Formation of new functional groups – chemical action If a reactive gas is introduced into the electric discharge gas, a complicated chemical reaction occurs on the surface of the activated material, and new functional groups such as hydrocarbonyl, amidogen, carboxyl group, and the like are introduced, and these functional groups are all active groups, which can significantly improve the surface activity of the material.   Ultra-low temperature atmospheric plasma cleaner structure: Plasma cleaner is mainly composed of two parts: First, the plasma generator is composed of integrated circuit, operation control, plasma generating power source, gas source processing, and safety protection. Second, the plasma processing apparatus is composed of an excitation electrode, an excitation gas path, and the like.   Ultra-low temperature atmospheric plasma cleaner technical advantages: German circuit technology: It adopts German high-voltage excitation power circuit technology to generate high-density plasma and ensure superior cleaning results.   Comprehensive security protection: Over temperature, overload, abnormal air pressure, short circuit, wrong operation, and other comprehensive alarm protection.   Patented discharge technology: Special treatment and special structure of the discharge device, leading atmospheric glow discharge technology.   Great processing width: Solve the problem of large-width sample cleaning, up to 2

NST DESKTOP UV OZONE CLEANER has proven to be highly effective for non-acidic, dry, non-destructive atomic cleaning and removal of organic contaminants using intense 185 nm and 254 nm UV light. Under air and room temperature, the 185 line produces Ozone and while the 254 line excites organic molecules on the surface. This combination drives the rapid destruction and decimation of organic contaminants.

Environment Requirement

• Indoor Use Only; Altitude Use Up To 5, 500 Feet;
• Temperature Range 41-104 Degrees Fahrenheit;
• Maximum Relative Humidity 80%, Up To 87 Degrees Fahrenheit Decreasing Linearly to 50% Relative Humidity At 104 Degrees Fahrenheit;
• Main power supply fluctuations not to exceed 10% of the nominal voltage; overvoltage category II;
• Pollution Degree 2; ozone level (ambient) measurement at <45 ppb.

UV   Lamp

• Solid metal double wave mercury lamp
• Wave Length: 253.7nm and 184.9nm
• UV lamp service life: 5000 hrs
• UV light area: 200×200 mm
• Can clean crystal wafer with diameter up to 12“

Chamber & Sample Stage

• Stainless steel case
• Sliding drawer for easy sample loading
• Sample stage area is 310 mm×320 mm (12″×12″ )
• Ozone venting device is built in the chamber
• Timer ranges from 0.01 seconds to 99.9 hours.

Heatable Sample Stage

• Sample stage is heatable up to 150 with precision temperature controller
• Temperature controller is 20 segments programmable with +/-2 accuracy
• Temperature uniformity:<10 within 6 inches diameter area; <20 within 12 inches diameter
• Heating rate: 15 max.
• The distance between sample stage and lamp is adjustable from 20mm to 40mm.

Vent Port

• 3 in. diameter vent port is built in the back of the machine
• One 10 ft. flexible pipe and one vent clamp are included for connecting the cleaner exhaust to a lab venting system.

Application

• Clean silicon wafer, Gallium Arsenide wafer, quartz and ITO glass
• Clean all types of oxide single crystal substrate such sapphire, STO, and LAO.
• Clean gold and Pt surface
• Oxidizing surface of light metallic material
• Activate Polymers and Crosslink Polymers
• UV Strip Photo Resist / Photoresist
• UV Clean Production Line LED displays

NST-3″ TWO ZONES CSS FURNACE is heated by two group of halogen heaters (Top and Bottom) separately with max. 20ºC/s heating rate. Two 30 segment precision temperature controllers are built in with +/-1ºC accuracy. RS485 port and control software are included to allow for the operation of furnace and temperature profile logging via PC. It is excellent tool to research new generation thin film for solar cells, such as CdTe, Sulfide, and Perovskite solar cell.

TWO ZONES CSS FURNACE WITH ROTATING WAFER HOLDER is heated by two group of halogen heaters (Top and Bottom) separately with max. 10ºC/s heating rate. The top sample holder is rotatable to achieve high uniformity coating. It is an excellent tool to research new generation thin film for solar cells, such as CdTe, Sulfide, and Perovskite solar cell.

FOUR SOURCES THERMAL EVAPORATION SYSTEM is suitable for coating most of metallic and organic materials film up to 2″ size from 200 ºC to 1500 ºC (or 200 ºC – 1700 ºC with an optional B-type thermocouple).The sample stage can be rotated to obtain a more uniform film.The evaporating system is small in size, which can effectively save laboratory space; it is easy to operate and has strong adaptability to different materials, so it is widely used in the laboratories of universities and research institutes.

• 280 mm O.D.×260 mm I.D.×310 mm Height quartz chamber for easy cleaning and sample loading
• 2″ Dia rotatable evaporating sources for the uniform film coating
• Tungsten coil heater and alumina crucible for high-temperature coating up to 1700 ºC
• Precision temperature control with 30 programmable segments and +/- 1 ºC accuracy
• High vacuum can be achieved up to 1.0E-5 Torr via optional turbopump
• Gas flow port and valve are built in for chamber purge and CVD possibility

DUAL CHAMBER PULSE LASER COATER is used for growing optical crystals, ferroelectrics, ferromagnets, superconductors and organic compound thin film materials, suitable for growing high melting point, multi-elements and complex layered superlattice thin film materials containing gas elements. It is widely used in the research and manufacture of thin film materials in colleges and universities.

COMPACT POWDER NST COATING SYSTEM is a small powder coating system consisting mainly of a 2-inch magnetron sputtering head and a vibrating sample stage. The powder is vibrated on the vibrating sample stage, and is coated on the surface of the powder by sputtering to form a core-shell structure. NST magnetron sputtering is suitable for metallic materials on powder surfaces. NST magnetron sputtering is suitable for coating non-metallic materials or carbon on the surface of materials.

Compact UV-Ozone Cleaner proven to be highly effective for non-acidic, dry, non-destructive atomic cleaning and removal of organic contaminants using intense 185 nm and 254 nm UV light. Under air and room temperature, the 185 line produces Ozone and while the 254 line excites organic molecules on the surface. This combination drives the rapid destruction and decimation of organic contaminants.

UV Lamp

• Solid metal double wave mercury lamp
• UV lamp power: 55W Max.
• Wave length: 254 nm and 185 nm
• UV Lamp service life: 2500 hrs
• UV light area: 100×100 mm ( 4″×4″)
• Peak UV intensities: 4.6 milliwatts/cm2.

Chamber & Sample Stage

• Overall Dimensions:   9 1⁄2” ×7 7/8” ×6”
• Drawer Dimensions:133mm×133mm×25mm
• Distance from drawer to lamp: 27mm
• Distance from pedestal to lamp: 8mm
• Borosilicate Glass Pedestal:  4”×4”×3⁄4”
• 18 Gauge Steel Chassis and Cover, Powder Coated Finish
• Total Weight: 9 lbs.

Environmental Requirement

• Indoor Use Only; Altitude Use Up To 5, 562 Feet;
• Temperature Range 41-104 Degrees Fahrenheit;
• Maximum Relative Humidity 80%, Up To 87 Degrees Fahrenheit Decreasing Linearly to 50% Relative Humidity At 104 Degrees Fahrenheit;
• Main Power Supply Fluctuations Not To Exceed 10% Of The Nominal Voltage; Overvoltage Category II;
• Pollution Degree 2; ozone level (ambient) measurement at <45 ppb.

Application:

• Cleaning molecular contamination from SPTs, AFM tips, and surfaces
• Curing UV-adhesives
• UV-photopatterning of SAM surfaces
• Oxidizing PDMS
• Surface sterilization
• Etch, pattern, sharpen
• Clean MEMS devices
• Clean substrate surfaces such as Si, Ge, GaAs and all oxide crystal  substrate

PLASMA CLEANER, also known as plasma surface treatment device, is a new high-tech technology that uses plasma to achieve the results that conventional cleaning methods cannot achieve. Plasma is a state of matter, also called the fourth state of matter, and does not belong to the common three-state of solid-liquid-gas. Applying enough energy to the gas to ionize it becomes a plasma state. The “active” components of the plasma include: ions, electrons, atoms, active groups, excited states of nuclides (metastasis), photons, and the like. Plasma cleaner is to treat the surface of the sample by utilizing the properties of these active components, thereby achieving the purpose of cleaning, coating, etc., improving the surface adhesion of the product, and facilitating the bonding, spraying, printing and sealing of the product.

Low processing temperature

The processing temperature can be as low as 80 and below 50 . Low processing temperatures ensure no thermal effects on the sample surface.

No pollution during the whole process

The plasma cleaner itself is a very environmentally friendly device that does not cause any pollution and does not cause any pollution during the treatment process. It can be combined with the original production line to achieve fully automatic online production, saving labor costs.

Stable treatment effect

The treatment effect of plasma cleaning is very uniform and stable, and the conventional sample maintains good effect for a long time after treatment.

70mm rotary spray gun plasma cleaner product principle:

The structure of the plasma cleaner is mainly divided into three major components, namely high-voltage excitation power supply, plasma generator spray gun, and control system.

High-voltage excitation power supply:

The generation of plasma requires high-voltage excitation, and the atmospheric low-temperature plasma is excited by an intermediate frequency power supply at a frequency of 10-40 kHz. The high voltage is at 4-10KV. The parameters can be adjusted according to the actual conditions of the sample, and the optimal modification effect has been achieved.

Plasma generator spray gun:

The atmospheric low-temperature plasma generator spray gun can be divided into two types: jet flow direct injection and rotary direct injection, the difference is that the treatment area is different.

Control system:

The control system functions is to control the operation of the entire atmospheric low temperature plasma cleaning equipment and the protection of the overall system.

PLASMA CLEANING MACHINE EQUIPMENT PRINCIPLE:

ETCHING ON THE SURFACE OF THE MATERIAL – PHYSICAL EFFECT

A large number of active particles in the plasma, such as a large number of ions, excited molecules, and free radicals, act on the surface of the solid sample, which not only removes the original contaminants and impurities, but also produces an etching effect to roughen the surface of the sample and form many fine pits, which increases the specific surface of the sample, improves the wetting properties of solid surfaces.

Activation bond energy, cross-linking

The energy of the particles in the plasma is between 0 and 20 eV, and most of the bond energy in the polymer are between 0 and 10 eV. Therefore, after the plasma acts on the solid surface, the original chemical bond on the solid surface can be broken. Free radicals in the plasma form a network of crosslinked structures with these bonds, greatly activating surface activity.

Formation of new functional groups – chemical action

If a reactive gas is introduced into the electric discharge gas, a complicated chemical reaction occurs on the surface of the activated material, and new functional groups such as hydrocarbonyl, amidogen, carboxyl group, and the like are introduced, and these functional groups are all active groups, which can significantly improve the surface activity of the material.

NST 27L512L Lithium Battery Electrode Vacuum Degassing Baking Oven

1 The NST-DZF-6210 Vacuum Degassing Oven is a larger volume designed vacuum oven for industrial use. It has a 200 litres about 7.5 cubic feet volume.

2 The NST-DZF-6210 Vacuum Degassing Oven for lithium battery field mainly used for lithium battery materials, electrode and battery core vacuum drying for production line.

3 Use Vacuum Oven for material heating drying under vacuum states has advantages:

1 Can reduce the drying temperature

2 Avoid some objects heating to oxidation

3 Avoid heating air to kill living cells

4 No dust damage

ATMOSPHERIC PLASMA SURFACE TREATMENT INSTRUMENT is an excellent tool for cleaning wafer surface before epitaxial or optical fiber before welding to obtain higher quality. This device also may be used for studying atmosphere pressure CVD.

Atmospheric plasma surface treatment instrument main features:

• High speed surface treatment with simple and safe operation
• Neither vacuum  nor chamber required with versatile plasma chemistry
• Handheld or in-line processing at low cost
• Light weight and compact size

Warranty & Certificate

• One year limited with lifetime support
• CE certified

Application Notes

• This Atmospheric Plasma Jet-Flow system is excellent to clean plastic, polymer and oxide substrate surface before coating
• This device also may be used for studying atmospheric pressure CVD.

NST-100-400°C CONVECTION DRYING OVEN WITH DIGITAL TEMPERATURE CONTROLLER

Structure

• Use mirror stainless steel tank, four and a half circular arc transition, clapboard stents can free loading and unloading, easy to clean.
• Adopt PID fuzzy logic controller, quickly reached set Tem, more accurate and stable.
• Configuration independent limit temperature alarm system, exceed limit temperature automatically interrupted, security.
• Diameter of 50 mm hole is on the box left, easy to operation and measuring temperature.

NST-110E Turbo Pumping Station

PLASMA CLEANER 5L

Featrues:

• Environmental technologies: plasma process is the role of gas – solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
• Wide adaptability: regardless of processing substrate type, such as metals, semiconductors, oxides, and most.

Applications

• Car industry: ignition coil engine oil seal film
• Defense industry: Aerospace electrical connectors, Kevlar deal
• Electronics industry: hard plastic parts, earphone, Cell phone cover
• Medical industry: intravenous infusion, catheter treatment
• Textile fiber, rubber and plastic industry and etc.

THE VACUUM ATMOSPHERE LIFTING FURNACE FOR SILICON CARBIDE HEATING ELEMENTS, USES the three layers of shell structure and the Japanese island of 40 program temperature control system, electric phase-shifting trigger, thyristor control, furnace using 1600 type of polycrystal alumina fibre materials imported from Japan, between the furnace shell is equipped with air cooling system, can rise quickly cooling, &energy-saving equilibrium temperature field, low surface temperature and elevating temperature rate quickly, the advantages of energy saving, convenient take material, don’t need a crucible tongs stretch into the furnace, suitable for high temperature material taking and vacuum sintering in high temperature annealing is colleges and universities, research institutes, industrial and mining enterprises do powder sintering, ceramic sintering, glass melting, high temperature experiment, the ideal product quality inspection.

30-920L 300°C Max. Convection Oven with Programmable Temperature Controller

Tmax-DSP is a 300°C Max. Ovens combine forced-air circulation and programmable temperature controller to achieve dependable, uniform furnace for a variety of laboratory applications like drying, storing, annealing. It is an ideal heating equipment for material R&D laboratories.

NST BASED HIGH VACUUM PUMPING SYSTEM are used in both laboratory and industrial applications. The standard Vacuum Pumping Systems consists of Rotary Vacuum Pump, Diffusion pumps and other hardware like valves, baffles, collar, gauge and plumbing lines etc., fully integrated and wired. Special Vacuum Pumping Systems are offered with Rotary Pumps, Root Pumps & Diffusion pumps or combination as per customer requirements, Auto Manual Valves, Modular Structure etc The Vacuum Pumping Systems, are trolley mounted with castor wheel for easy movement, and are capable of achieving an ultimate vacuum of 10-6 m.bar. Liquid nitrogen trap given as optional is to minimize the back-streaming of oil vapors, and ensures clean and better ultimate vacuum of 10-6m.bar range. The vacuum pumping systems are fitted with Pirani Gauge to measure the roughing and backing vacuum & Penning gauge for measuring the high vacuum. Option is available for Digital & Analogue type of gauges.

Features:

• All components easily accessible
• Compact construction
• Simple operation
• Allows direct connection of Vacuum Chamber
• Pumping speed ranging from 120 lps to 3000 lps
• Ultimate (Unbaffled) vacuum better than 10-6 m bar (with LNT)
• D.P., baffles, valves, collar & plumbing are S.S. construction Optional      Optional accessories
• Liquid Nitrogen Trap given as optional.
• Water Cooled Chevron Baffle given as optional.
• Electro pneumatically operated valve. (Butterfly valve, Rightangle Valve)
• Push buttons, automatic versions are available on request

The equipment features and the main purpose

Basic principles and uses In the case of vacuum or atmosphere protection of the material for non-polluting heat treatment equipment can be nitrogen argon hydrogen and other atmosphere sintering.  Mainly used in high temperature atmosphere sintering high temperature vacuum sintering transparent ceramics and other materials sintering.

The structure of the composition

Furnace body furnace lid bottom vacuum system control system cooling system heating body and insulation screen.

The structure that

• The furnace vertical shell its inner and outer are made of 304 stainless steel cylinder the outer mirror polished.  Inside and outside the tube and the front and rear flange welded into a whole the furnace body with electrode holes suction holes vent holes thermocouple holes infrared holes and observation holes the interface materials are stainless steel.
• The lid from inside and outside the head and flange welding the middle of the water can be cooled the lid open device.
• The bottom the inside and outside the head and flange composition the middle of the water cooling the lower part of the filling and discharging holes fixed in the lower part of the furnace with electrode extraction device.
• Heating body and insulation screen heating elements made of high purity film effectively increase the radiation area to ensure uniformity of the temperature zone.  The bottom of the insulation screen with a tungsten plate the other using the template and stainless steel plate production.
• The vacuum system mainly by the direct pump molecular pump or diffusion pump pneumatic baffle valve pneumatic shut-off valve digital composite vacuum gauge vacuum pipe bleed valve bracket and other components; vacuum pipe and pump between  Metal corrugated hose quick connector connection (slow vibration).

The control system

A computer automatic control system (optional)

• Automatic PLC flat panel touch computer control (XP) system you can manually switch automatically.  Features are as follows
• The control system software is developed by our company man-machine interface operating system picture-friendly simple operation fast running real-time monitoring of the furnace conditions the system is stable and reliable.
• Software color simulation screen display industrial grade Tablet PC fast response anti-interference ability temperature display and vacuum valve control are integrated analog screen operation.
• The device can adopt the temperature curve power curve vacuum curve water temperature curve air pressure curve and sintering time curve user-friendly analysis based on historical curve sintering process.  Data can automatically generate excel file through the usb interface test.
• The temperature control method for the following thermocouple 1700 temperature control more than 1700 infrared instrument automatic control high and low temperature automatic conversion.
• Communication interface such as RS232 RS422 CAN LAN USB etc. easy and other equipment networking applications.  Software control interface visualization can dynamically display the workflow convenient and intuitive.
• The software free upgrade for life.

Standard configuration manual instrument automatic temperature control 1700 below the thermocouple temperature control more than 1700 infrared instrument automatic control high and low temperature automatic conversion.

Water cooling system the furnace the upper and lower end of the cover with water-cooled structure of the form in and out of the water main pipe installed on the hydraulic relay and pressure gauge while the control cabinet connected to the abnormal state alarm.  Can qualitatively observe the water flow size of each waterway.  The entire water cooling system to ensure.

Advantages

• Scraping system, parts processing precision, slurry contact part stainless steel structure, scraping thickness adjustable.
• Main transmission adopts frequency control of motor speed, wide speed range speed constant and reliable for the speed control system, constant torque
• Drying box adopts far infrared heating pipe, high heat efficiency, long service life
• Using hot air circulation system, can make the temperature uniform, not easy to burn the pole piece
• Temperature control adopts PID control system, high control accuracy, reliable work
• The reeling adopts automatic correction system, pole piece coiling system