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We are leaders in the market for providing best range of NST-PSC180G Desktop Plasma Sputtering Coater, NST Desktop plasma sputtering coater with rotary sample stage, NST Desktop plasma sputtering coater with rotary sample stage (Manual), Nst Psp180g-3ta Three Target Heads Plasma Sputtering Coater and NST MSP300S-3NST Three Target Magnetron Sputtering Coater
This type of SMALL PLASMA SPUTTERING COATING MACHINE adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage.This small plasma sputtering coater uses PLC control system, all touch screen operation, easy to learn and use. This model machine is also equipped with a rotatable sample stage, which can effectively improve the uniformity of the coating. This small plasma sputtering instrument uses a PLC control system, all touch screen operation, easy to learn and use. The equipment is small in size and beautiful in appearance, making it the best choice for laboratory coating experiments.
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Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Sample stage | Size | 135 mm |
|---|---|---|
| Rotating speed | 1~20rpm adjustable | |
| Plasma sputtering source | Quantity | 2 inchesx1 |
| Cooling method | Natural cooling | |
| Vacuum chamber | Chamber size | φ180mm x 210mm |
| Observation window | Omnidirectional visibility | |
| Chamber material | High purity quartz | |
| Open method | Top cover removable | |
| Upper and lower cover material | 304 stainless steel | |
| Pumping port | KF25 | |
| Intake port | 1/4 inch ferrule connector | |
| Power configuration | Quantity | DC power supplyx1 |
| Output power | Max. 150W | |
| Sputtering power | 1200V | |
| Max. sputtering current | 50mA | |
| Vacuum system | Vacuum pump type | Dual-stage rotary vane vacuum pump |
| Pumping port | KF25 | |
| Exhaust interface | KF25 | |
| Pumping rate | 250L/m(15m3/h) | |
| Ultimate vacuum | ≥0.1Pa | |
| Vacuum measurement | Resistance vacuum gauge | |
| Others | Power supply | AC 220V 50Hz |
| Total power | 1.5kW | |
| Dimension | 500mm x 320mm x470mm | |
| Weight | 30kg |
This type of SMALL PLASMA SPUTTERING COATING machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage.
Additional Information:
Payment Terms : L/C, T/T, Western Union
This type of SMALL PLASMA SPUTTERING COATING machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage.
Additional Information:
Payment Terms : L/C, T/T, Western Union
NST THREE TARGET HEADS PLASMA SPUTTERING COATER is a cost-effective plasma sputter coating equipment independently developed by our company. The plasma sputtering target is a standard size of 2 inches. Customers can choose different configurations of 13 target heads according to their needs to meet the different experimental needs of single-layer film or multilayer films of various materials. The instrument is equipped with a 150W DC high-voltage power supply, which can be used for metal sputter coating, especially for the coating of metals such as gold, silver and copper. This film coater is equipped with a gas connection for the introduction of protective gas. The instrument adopts touch screen control, which is simple and intuitive to use. It can realize the operation of coating start and stop, switch target head position and baffle rotation with one button, which is very suitable for laboratory purchase.
This film coater is equipped with a two-stage rotary vane vacuum pump. It has the advantages of small volume, quick vacuuming and simple operation. If customers need to further improve the vacuum degree, you can contact the technician to select the molecular pump group to form a high vacuum system.
Two target heads plasma sputtering coater application
It can be used for metal sputter coating, especially for metal coatings such as gold, silver and copper.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Three Target Heads Plasma Sputtering Coater Technical Parameters:
| Sample stage | Size | φ138mm | Temperature control accuracy | ±1℃ |
|---|---|---|---|---|
| Heating temperature | Max 500℃ | Rotate speed | 1-20rpm adjustable | |
| DC sputtering target head | Quantity | 2”×3 | ||
| Vacuum chamber | Chamber size | φ180mm×150mm | Watch window | Omnidirectional transparent |
| Chamber material | High purity quartz | Opening mode | Top cover removable | |
| Vacuum system | Mechanical pump | rotary vane pump | Pumping interface | KF16 |
| Vacuum measurement | Resistance gauge | Exhaust interface | KF16 | |
| Ultimate vacuum | 1.0E-1Pa | Power supply | AC;220V 50/60Hz | |
| Pumping rate | rotary vane vacuum pump: 1.1L/S | |||
| Power configuration | Quantity | DC power supply×1 | Max output power | 150W |
| Other parameters |
Supply voltage | AC220V,50Hz | Overall size | 360mm×300mm×470mm |
| Total power | 800W | Total Weight | 40kg | |
The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
Three targets NST magnetron sputtering coater application:
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Sample stage | Size | φ185mm | Temperature control accuracy | ±1℃ |
|---|---|---|---|---|
| Heating temperature | Max 500℃ | Rotate speed | 1-20rpm adjustable | |
| Magnetron Sputtering target head | Quantity | 2”×3 (1”,2” optional) | Water chiller | Circulating water chiller with flow rate of 10L/min |
| Cooling mode | Water cooling | |||
| Vacuum chamber | Chamber size | φ300mm×300mm | Watch window | φ100mm |
| Chamber material | Stainless steel | Opening mode | Top cover open | |
| Mass flowmeter | 2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs) | |||
| Vacuum system | Model | NST-GZK103-A | Pumping interface | KF40 |
| Molecular pump | NST-600 | Exhaust interface | KF16 | |
| Backing pump | rotary vane pump | Vacuum measurement | Compound vacuum gauge | |
| Ultimate vacuum | 1.0E-5Pa | Power supply | AC;220V 50/60Hz | |
| Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes | |||
| Power configuration | Quantity | NST power supply×3 | Max output power | NST 300 W |
| Other parameters | Supply voltage | AC220V,50Hz | Overall size | 600mm×650mm×1280mm |
| Total power | 2.5KW | Total Weight | 300kg | |
The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
Three targets magnetron sputtering coater application:
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, this three targets magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Sample stage | Size | φ185mm | Temperature control accuracy | ±1℃ |
|---|---|---|---|---|
| Heating temperature | Max 500℃ | Rotate speed | 1-20rpm adjustable | |
| Magnetron Sputtering target head | Quantity | 2”×3 (1”,2” optional) | Water chiller | Circulating water chiller with flow rate of 10L/min |
| Cooling mode | Water cooling | |||
| Vacuum chamber | Chamber size | φ300mm×300mm | Watch window | φ100mm |
| Chamber material | Stainless steel | Opening mode | Top cover open | |
| Mass flowmeter | 2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs) | |||
| Vacuum system | Model | NST-GZK103-A | Pumping interface | KF40 |
| Molecular pump | NST-600 | Exhaust interface | KF16 | |
| Backing pump | rotary vane pump | Vacuum measurement | Compound vacuum gauge | |
| Ultimate vacuum | 1.0E-5Pa | Power supply | AC;220V 50/60Hz | |
| Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes |
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| Power configuration | Quantity | NST power supply×3 | Max output power | NST 500 W |
| Other parameters | Supply voltage | AC220V,50Hz | Overall size | 600mm×650mm×1280mm |
| Total power | 3KW | Total Weight | 300kg | |
The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
Three targets magnetron sputtering coater application:
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, this three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Sample stage | Size | φ185mm | Temperature control accuracy | ±1℃ |
|---|---|---|---|---|
| Heating temperature | Max 500℃ | Rotate speed | 1-20rpm adjustable | |
| Magnetron Sputtering target head | Quantity | 2”×3 (1”,2” optional) | Water chiller | Circulating water chiller with flow rate of 10L/min |
| Cooling mode | Water cooling | |||
| Vacuum chamber | Chamber size | φ300mm×300mm | Watch window | φ100mm |
| Chamber material | Stainless steel | Opening mode | Top cover open | |
| Mass flowmeter | 2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs) | |||
| Vacuum system | Model | NST-GZK103-A | Pumping interface | KF40 |
| Molecular pump | NST-600 | Exhaust interface | KF16 | |
| Backing pump | rotary vane pump | Vacuum measurement | Compound vacuum gauge | |
| Ultimate vacuum | 1.0E-5Pa | Power supply | AC;220V 50/60Hz | |
| Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes | |||
| Power configuration | Quantity | NST power supply×2 RF power supply ×1 |
Max output power | DC 500 W, RF 300W |
| Other parameters | Supply voltage | AC220V,50Hz | Overall size | 600mm×650mm×1280mm |
| Total power | 3.5KW | Total Weight | About 300kg | |
THE MAGNETRON TARGET HEAD OF THE MAGNETRON SPUTTERING COATER has 1 inch and 2 inches to choose from. Customers can choose the target according to the size of the substrate to be plated. The device is equipped with 150W NST power supply, which can be used for metal sputter coating. The coating machine is equipped with gas inlet port for the introduction of protective gas. If the customer needs the mixed gases, the staff can be contacted to configure the high-precision mass flow meter to meet the experimental needs. The instrument is equipped with advanced turbomolecular pump set, the ultimate vacuum is up to 1.0E-5pa, and other types of molecular pumps are also available.
Small desktop single-target magnetron sputtering coater application:
The device can be used to prepare single-layer ferroelectric thin films, conductive films, alloy films, and so on. Compared with similar equipment, the single-target magnetron sputtering coater is compact, highly integrated and small in size, and can be placed on a desktop. It is an ideal equipment for laboratory preparation of material films.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Sample stage | Size | φ138mm | Temperature control accuracy | ±1℃ |
|---|---|---|---|---|
| Heating temperature | Max 500℃ | Rotate speed | 1-20rpm adjustable | |
| Magnetron Sputtering target head | Quantity | 2”×1 (1”,2” optional) | Water chiller | Circulating water chiller with flow rate of 10L/min |
| Cooling mode | Water cooling | |||
| Vacuum chamber | Chamber size | φ180mm×215mm | Watch window | Omnidirectional transparent |
| Chamber material | High purity quartz | Opening mode | Top cover removable | |
| Vacuum system | Model | NST-GZK103-A | Pumping interface | KF40 |
| Molecular pump | NST-600 | Exhaust interface | KF16 | |
| Backing pump | rotary vane pump | Vacuum measurement | Compound vacuum gauge | |
| Ultimate vacuum | 1.0E-5Pa | Power supply | AC;220V 50/60Hz | |
| Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes |
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| Power configuration | Quantity | NST power supply x1 | Max output power | 150W |
| Other parameters | Supply voltage | AC220V,50Hz | Overall size | 500mm×350mm×400mm |
| Total power | 1.7KW(Vacuum pump1.5KW+machine0.2KW) | Total Weight | 30kg | |
The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
Single-target magnetron sputtering coater application:
The device can be used to prepare single-layer ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the single-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material films, especially suitable for research on solid electrolyte and OLED in the laboratory.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Sample stage | Size | φ185mm | Temperature control accuracy | ±1℃ |
|---|---|---|---|---|
| Heating temperature | Max 500℃ | Rotate speed | 1-20rpm adjustable | |
| Magnetron Sputtering target head | Quantity | 2”×1 (1”,2”,3”optional) | Water chiller | Circulating water chiller with flow rate of 10L/min |
| Cooling mode | Water cooling | |||
| Vacuum chamber | Chamber size | φ300mm×300mm | Watch window | φ100mm |
| Chamber material | Stainless steel | Opening mode | Top cover removable | |
| Mass flow meter | 2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs) | |||
| Vacuum system | Model | NST-GZK103-A | Pumping interface | KF40 |
| Molecular pump | NST-600 | Exhaust interface | KF16 | |
| Backing pump | rotary vane pump | Vacuum measurement | Compound vacuum gauge | |
| Ultimate vacuum | 1.0E-5Pa | Power supply | AC;220V 50/60Hz | |
| Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes | |||
| Power configuration | Quantity | RF power supply x1 | Max output power | 300W |
| Other parameters | Supply voltage | AC220V,50Hz | Overall size | 600mm×650mm×1280mm |
| Total power | 2KW | Total Weight | 300kg | |
The coating machine has a two-channel high precision mass flow meter. If customers have other requirements, the gas path of up to four-channel mass flow meter can be customized to meet the complex gas environment requirements. The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
Single target magnetron sputtering coater application:
This device can be used for preparing single-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the single target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Sample stage | Size | φ185mm | Temperature control accuracy | ±1℃ |
|---|---|---|---|---|
| Heating temperature | Max 500℃ | Rotate speed | 1-20rpm adjustable | |
| Magnetron Sputtering target head | Quantity | 2”×1 (1”,2”,3”, 4”optional) | Water chiller | Circulating water chiller with flow rate of 10L/min |
| Cooling mode | Water cooling | |||
| Vacuum chamber | Chamber size | φ300mm×300mm | Watch window | φ100mm |
| Chamber material | Stainless steel | Opening mode | Top cover open | |
| Mass flowmeter | 2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs) | |||
| Vacuum system | Model | NST-GZK103-A | Pumping interface | KF40 |
| Molecular pump | NST-600 | Exhaust interface | KF16 | |
| Backing pump | rotary vane pump | Vacuum measurement | Compound vacuum gauge | |
| Ultimate vacuum | 1.0E-5Pa | Power supply | AC;220V 50/60Hz | |
| Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes | |||
| Power configuration | Quantity | NST power supply×1 | Max output power | 1500W |
| Other parameters | Supply voltage | AC220V,50Hz | Overall size | 600mm×650mm×1280mm |
| Total power | 3KW | Total Weight | 300kg | |
NST-IN-LINE MAGNETRON SPUTTERING SYSTEM mainly consists of a loading sample chamber, a sputtering chamber, a output sample chamber, a substrate transfer mechanism, a pumping and vacuum measuring system, a gas circuit system, an electronic control system, and a mounting base. In addition, after the system is upgraded, it would be a 5 chamber structure: the loading sample chamber, 3 independent sputtering chambers, output sample chamber; Rf power supply is added to provide the function of preparing dielectric film and realize continuous coating.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Main sputtering chamber | Square vacuum chamber, size: 1000×700×350mm | |
|---|---|---|
| Loading samplechamber | Cylindrical, bed chamber, dimension: 250×420mm | |
| Vacuum system | Molecular pump, mechanical pump, gate valve | |
| Ultimate pressure | Main sputtering chamber | ≤8×10-5Pa (after baking degassing) |
| Loading sample chamber | ≤6.6×10-4Pa (after baking degassing) | |
| Vacuum recovery time |
Main sputtering chamber | Can reach 6.6×10-4Pa in 40 mins (The system exposed the atmosphere for a short time and filled with dry nitrogen to start pumping) |
| Loading sample chamber | Can reach6.6×10-3Pa in 20 mins (The system exposed the atmosphere for a short time and filled with dry nitrogen to start pumping) | |
| Magnetic target component | Rectangular target size: 450×45 mm | |
| Distance between target and sample: 80mm adjustable | ||
| Substrate heating platform | Substrate size | 125×125mm or 156×156mm, 4 samples can be installed at one time |
| Heating temperature | Room temperature: 400℃±2℃, adjustable | |
| Gas circuit system | Mass flow controller 3 circuits | |
| Space occupied | Main unit | 2655×930mm² |
| Electric cabinet | 700×700mm² (Two) | |
| After-sales service | after the goods are delivered, CYKY provides one year of free after-sales service. The service method is limited to remote technical support such as telephone guidance, video guidance, mail guidance, and accessories mailing. If the customer needs to send someone to provide door-to-door service, the customer shall pay the travel expenses and wages of the service personnel during the business trip. | |
NST-DUAL-HEAD HIGH VACUUM MAGNETRON PLASMA SPUTTERING COATER is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE, etc.Compared with similar equipment, it has the advantages of small size and easy operation, and a wide range of materials that can be used. It is an ideal equipment for preparing various types of material films in the laboratory.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Input Power | Single phase 220 VAC 50 / 60 Hz, 2000 W (including vacuum pump and water chiller) |
|---|---|
| Source Power | Two sputtering power sources are integrated into one control box DC source: 500 W power for coating metallic materials RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials |
| Magnetron Sputtering Head | Two 2″ Magnetron Sputtering Heads with water cooling jackets and shutters are included One Sputting Head Model also available in this product page (in product options) One is connected to DC source for coating metallic materials The other one is connected to RF source for non-conductive materials Target size requirement: 2″ diameter Thickness range: 0.1 – 5 mm for both metallic and non-conductive targets (including backing plate) One Stainless Steel Target target and one Research Grade Al2O3 target are included for demo testing Customized coater: Two DC heads without RF; two RF heads without DC; 3 RF heads are available upon request |
| Vacuum Chamber | Vacuum chamber: 300 mm Dia. ×300 mm Height, made of stainless steel Viewport: Two pieces of 100 mm Dia. glass. One fixed; one detachable for cleaning and replacement Hinged type lid with pneumatic power pole allows easy target change |
| Sample Stage | Sample holder is a rotatable and heatable stage made of ceramic heater with copper cover Sample holder size: 140 mm Dia. for. 4″ wafer max Rotation speed: 1-20 rpm adjustable for uniform coating The holder temperature is adjustable from RT to 500 °C max (2 hr max) with accuracy +/- 1.0 °C via a digital temperature controller |
| Gas Flow Control | Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gasses Flow rate: 0–200 mL/min adjustable on the touch screen control panel Air inlet valve is installed for vacuum release |
| Vacuum Pump Station | A mobile pump station is included. The sputtering coater can be placed on top of station High-speed turbo pump at speed 80L/S is combined with a two-stage mechanical pump (220 L/min) for max vacuum level and faster pumping speed Standard vacuum level connected with chamber : < 4.0E-5 Torr. (1.0E-6 Torr with chamber baking ) |
| Water Chiller | One digital temperature controlled recirculating water chiller is included. Refrigeration range: 5~35 °C Flow rate: 16 L/min Pump pressure: 14 psi |
| Overall Dimensions | Lid closed: 48″ × 28″ × 32″ Lid open: 48″ × 28″ × 37″ |
| Net Weight | 160 kg |
| Warranty | One years limited warranty with lifetime support |
600-3HD THREE-TARGET MAGNETRON SPUTTERING COATER is a newly developed coating equipment, which can be used to prepare monolayer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical Film, oxide film, hard film, polytetrafluoroethylene film, and the like. Compared with similar equipment, it is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material films, especially suitable for laboratory research on solid electrolytes and OLEDs.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Name | NST-300-3HD three-target magnetron sputtering coater | ||
|---|---|---|---|
| Model | NST-300-3HD | ||
| Installation conditions | This equipment is required to be used at the altitude of 1000m or less, the temperature of 25℃± 15℃, and the humidity of 55% Rh ± 10% Rh. 1. Water: The equipment is equipped with a self-circulating chiller (filling pure water or deionized water) 2. Electricity: AC220V 50Hz, must have a good ground connection. 3. Gas: The equipment chamber needs to be filled with argon gas (purity of 99.99% or more). Self-provided argon gas cylinder (with Ø6mm double ferrule joint) and pressure reducing valve 4. Workbench: size 650mm × 600mm × 700mm, bearing more than 200kg 5. Ventilation device: need |
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| Main features | 1. Configure three target guns, it can be used for RF coating power supply for sputter coating of non-conductive targets, or DC power supply for sputter coating of conductive materials (target guns can be exchanged according to customer needs). 2. It can prepare a variety of films, and has a wide range of applications. 3. It is small in size and easy to operate. 4. the modular design of the whole machine, vacuum chamber, vacuum pump set, control power supply split type design, it can be adjusted according to the actual needs of users. 5. you can choose the power supply according to your actual needs, it can control multiple target guns with one power supply, or control one target gun with multiple power sources |
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| Technical parameters | 1. the power supply voltage: 220V 50Hz 2. total power: 2.5W (excluding vacuum pump) 3. Working vacuum degree: 10-4Pa 4. working temperature: RT-500℃, accuracy ± 1℃(you can increase the temperature according to actual needs) 5. the number of target guns: 3 6. target gun cooling method: water cooling 7. Target size: Ø2’’, thickness 0.1-5mm (different thickness depending on target material) 8. DC sputtering power: 500W (optional) 9. RF sputtering power: 300W / 500W (optional) 10. loading sample table: Ø140mm 11. the sample table speed: adjustable within 1rpm-20rpm 12. Protective gas: inert gases such as Ar and N2 13. Intake gas path: mass flow meter controls 2 channels of intake air, 1 flow is 100 SCCM, 1 flow is 200 SCCM |
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| specifications | Main unit size: 500mm×560mm×660mm, the whole machine size: 1300mm×660mm×1200mm; weight: 160kg | ||
| Standard accessories | 1 | DC power control system | 1 |
| 2 | RF power control system | 1 | |
| 3 | Film thickness monitor system | 1 | |
| 4 | Molecular pump | 1 | |
| 5 | Chiller | 1 | |
| 6 | Cooling water pipe (Ø6mm) | 4 | |
| Standard accessories | Various targets such as gold, indium, silver, and platinum | ||
300-2HD DUAL TARGET MAGNETRON SPUTTERING COATER is a high vacuum coating equipment independently developed by our company. It can be used to prepare monolayer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film and ceramic. Film, dielectric film, optical film, oxide film, hard film, polytetrafluoroethylene film, and the like. Compared with similar equipment, it has the advantages of small size and easy operation, and a wide range of materials that can be used. It is an ideal equipment for preparing various types of material films in the laboratory.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Name | Dual target magnetron sputtering coater | ||
|---|---|---|---|
| Model | 300-2HD | ||
| Installation conditions | This equipment is required to be used at the altitude of 1000m or less, the temperature of 25℃±15℃, and the humidity of 55% Rh ± 10% Rh. 1. Water: The equipment is equipped with a self-circulating chiller (filling pure water or deionized water) 2. Electricity: AC220V 50Hz, must have a good ground connection. 3. Gas: The equipment chamber needs to be filled with argon gas (purity of 99.99% or more). Self-provided argon gas cylinder (with Ø6mm double ferrule joint) and pressure reducing valve 4. Workbench: size 650mm × 600mm × 700mm, bearing more than 200kg 5. Ventilation device: need |
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| Main features | 1. Configure two target guns, A matching RF power supply is used for sputter coating of non-conductive targets, and a matching DC power supply is used for sputter coating of conductive materials. 2. It can prepare a variety of films, and has a wide range of applications. 3. It is small in size and easy to operate. |
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| Technical parameters | 1. the power supply voltage: 220V 50Hz 2. rated power: 1200W (excluding vacuum pump) 3. Working vacuum degree: 10-4Pa 4. working temperature: RT-500℃, accuracy ± 1×(you can increase the temperature according to actual needs) 5. the number of target guns: 1 6. target gun cooling method: water cooling 7. Target size: Ø2’’, thickness 0.1-5mm (different thickness depending on target material) 8. DC sputtering power: 500W (optional) 9. RF sputtering power: 300W / 500W (optional) 10. loading sample table: Ø140mm 11. the sample table speed: adjustable within 1rpm-20rpm 12. Protective gas: inert gases such as Ar and N2 13. Intake gas path: mass flow meter controls 2 channels of intake air, flow rate is 200SCCM |
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| specifications | Main unit size: 500mm × 560mm × 660mm, the whole machine size: 1300mm × 660mm × 1200mm; weight: 160kg | ||
| Standard accessories | 1 | DC power control system | 1 |
| 2 | RF power control system | 1 | |
| 3 | Film thickness monitor system | 1 | |
| 4 | Molecular pump | 1 | |
| 5 | Chiller | 1 | |
| 6 | Cooling water pipe (Ø6mm) | 4 | |
| Standard accessories | Various targets such as gold, indium, silver, and platinum | ||
NST -300-1HD SINGLE TARGET MAGNETRON SPUTTERING COATER is a high vacuum coating equipment independently developed by our company. It can be used to prepare monolayer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film and so on. The instrument is equipped with a magnetron sputtering target with a water-cooled interlayer and a 140mm heatable rotary object stage. The vacuum chamber adopts the top opening method, which makes it easier to change the target, and it is an ideal device for making various metal films. It is an ideal equipment for the preparation of films of various materials in the laboratory.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Product name | Single target magnetron sputtering coater | ||
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| Product model | CYKY -300-1HD | ||
| Installation conditions | This equipment is required to be used at the altitude of 1000m or less, the temperature of 25℃± 15℃, and the humidity of 55% Rh ± 10% Rh. 1. Water: The equipment is equipped with a self-circulating chiller (filling pure water or deionized water) 2. Electricity: AC220V 50Hz, must have a good ground connection. 3. Gas: The equipment chamber needs to be filled with argon gas (purity of 99.99% or more). Self-provided argon gas cylinder (with Ø6mm double ferrule joint) and pressure reducing valve 4. Workbench: size 650mm × 600mm × 700mm, bearing more than 200kg 5. Ventilation device: need |
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| Main features | 1. Configure a single target gun, and a matching DC power supply for sputter coating of conductive materials. 2. It can prepare a variety of films, and has a wide range of applications. 3. It is small in size and easy to operate. |
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| Technical parameters | 1. the power supply voltage: 220V 50Hz 2. rated power: 1200W (excluding vacuum pump) 3. Working vacuum degree: 10-4Pa 4. Working temperature: RT-500℃, accuracy ± 1×(you can increase the temperature according to actual needs) 5. the number of target guns: 1 6. target gun cooling method: water cooling 7. Target size: Ø2’’, thickness 0.1-5mm (different thickness depending on target material) 8. DC sputtering power: 500W (optional) 9. RF sputtering power: 300W / 500W (optional) 10. loading sample table: Ø140mm 11. the sample table speed: adjustable within 1rpm-20rpm 12. Protective gas: inert gases such as Ar and N2 13. Intake gas path: mass flow meter controls 2 channels of intake air, flow rate is 200SCCM |
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| Product specification | Main unit size: 500mm × 560mm × 660mm, the whole machine size: 1300mm × 660mm × 1200mm; weight: 160kg | ||
| Standard accessories | 1 | NST power control system | 1 |
| 2 | Film thickness monitor system | 1 | |
| 3 | Molecular pump | 1 | |
| 4 | Chiller | 1 | |
| 5 | Cooling water pipe (Ø6mm) | 4 | |
| Optional accessories | Various targets such as gold, indium, silver, and platinum | ||
| After-sales service | After the goods are delivered, CYKY provides one year of free after-sales service. The service method is limited to remote technical support such as telephone guidance, video guidance, mail guidance, and accessories mailing. If the customer needs to send someone to provide door-to-door service, the customer shall pay the travel expenses and wages of the service personnel during the business trip. | ||
NST 3 ROTARY TARGET PLASMA SPUTTERING COATER is a compact plasma thin film sputter (DC common type). The control panel adopts the touch screen mode. The substrate has a limit of 2″, the sample is placed with a diameter of Ø50mm and the heating temperature is 500.3 rotary target plasma sputtering coater can sputter gold, silver and copper targets, and can not sputter light metals and carbon. This machine uses a rotating sample stage to sequentially coat three layers on the same sample.The film is suitable for the preparation of samples in the laboratory.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Input Power | Single phase 220 VAC, 50 / 60Hz 700 W (including vacuum pump) For using 110 VAC, we will include a transformer for you. |
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| Output Power | 1600 VDC,40 mA max |
| Vacuum Chamber | Vacuum chamber: 150 mm ID×165mm OD×150 mm H, made of high purity quartz Sealing flange made of stainless steel with flat O-ring |
| Sample Stage with Heater | Stage size: 50 mm Dia. Sputtering distance range: 25 –40 mm adjustable Rotatable stage with three sputtering positions (controlled by the touch screen) Substrate heater is built-in with a maximum heating temperature of 500 °C PID temperature controller with +/- 1 °C accuracy is integrated into the touch screen |
| Control Panel | 6” color touch screen with PLC integration for easy operation Vacuum gauge, sputtering current meter, and substrate temperature control are integrated to the touch screen panel Adjustment knobs on the front panel for gas intake and sputtering current control Sputtering position, sputtering timer, and process logging are accessible from the touch screen |
| Shield | Stainless steel shield cage is included for extra protection |
| Sputtering Targets | Target size requirements: 47 mm Dia.×2.5 mm max Three targets are included in the standard package for immediate use: Au target, 47 mm Dia.×0.12 mm Ag target, 47 mm Dia.×0.5 mm Cu target, 47 mm Dia.×2.5 mm You may order various targets at CYKY |
| Dimensions | 440 mm L × 330 mm W × 455 mm H |
| Net Weight | 50 kg |
| Warranty | One year limited with lifetime support |
| Notes | HIGH VOLTAGE! Sputtering heads connect to high voltage. For safety, the operator must shut down the equipment before sample loading and target changing operations |
NST 3 HEADS COMPACT RF PLASMA MAGNETRON SPUTTERING COATER is mainly used to make non-conductive films, especially some oxide films.It is the most cost-effective coater for researching in the new generation of oxide thin films.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Input Power | Single phase 220 VAC, 50 / 60 Hz 1000 W (including vacuum pump and water chiller) If the voltage is 110 V, a 1500 W transformer can be ordered at our company |
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| Power Source | 13.5 MHz, 100 W RF generator with manual matching is included and connected to the sputtering heads Load range: 0 – 80 Ω adjustable. Tuning range: -200j – 200j adjustable The rotatable switch can activate one sputtering head at a time. Sputtering heads can be switched “in the plasma” (no breaking of vacuum and plasma during a multilayer process) With a DC power supply, the coater can be easily modified into 1” DC sputtering sources for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations |
| Magnetron Sputtering Head | Three 1″ magnetron sputtering heads with water cooling jackets are included and inserted into quartz chamber via quick clamps One manually operated shutter is built on the flange One 10 L/min digitally controlled recirculating water chiller is included for cooling sputtering heads |
| Sputtering Target | Target size requirement: 1″ diameter×1/8″ thickness max Sputtering distance range: 50 – 80 mm adjustable Sputtering angle range: 0 – 25° adjustable 1″ diameter Cu target and Al2O3 target are included for demo testing |
| Vacuum Chamber | Vacuum chamber: 256 mm OD×238 mm ID×276 mm Height, made of high purity quartz Sealing flange: 274 mm Dia. made of Aluminum with high-temperature silicone O-ring Stainless steel shield cage is included for 100% shielding of RF radiation from the chamber Max vacuum level: 1.0E-5 Torr with optional turbo pump and chamber baking |
| Sample Holder | Sample holder is a rotatable and heatable stage made of ceramic heater with stainless steel cover Sample holder size: 50 mm Dia. for. 2″ wafer max Rotation speed: 1-10 rpm adjustable for uniform coating The holder temperature is adjustable from RT to 600 °C max (5 min max at 600 °C; 2 hr max at 500 °C) with accuracy +/- 1.0 °C via a digital temperature controller |
| Vacuum Pump | KF40 vacuum port is built in for connecting to a vacuum pump. Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump |
NST VACUUM MAGNETRON SPUTTERING SYSTEM is used for the preparation of novel thin film materials such as nanometer single-layer and multi-layer functional film, hard film, metal film, semiconductor film and dielectric film. It can be widely used in the research and production of thin film materials in colleges and universities.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Vacuum chamber | Cylindrical front opening structure, size Ø450×40mm | |
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| Vacuum system configuraition | Compound molecular pump, mechanical pump, pneumatic gate valve, imported SMC cylinder throttle valve | |
| Ultimate pressure | ≤6.6*10-6 Pa(after baking and degassing) | |
| Vacuum recovery system | It can reach 6.6×10-4pa in 25 minutes(start pumping after short exposure to air and filled with dry helium) | |
| Magnetron target unit | Three sets of permanent magnetic target; target sizeØ60mm(one of those can be used for sputtering ferromagnetism materials )；Each target rf sputtering is compatible with dc sputtering.Water cooling within the target; The sample centers of the three targets can fold upward together. The distance between target and sample is adjustable from 90 to 130mm. Each target is equipped with imported SMC rotary pneumatic baffle | |
| Single substrate heating table | Sample size | Ø4 inches |
| Mode of motion | Substrate rotates continuously, rotation speed 0-30 rpm | |
| Heating | Heated by imported heating wire, max heating temperature 600℃±1℃ | |
| Battle format | Imported SMC angle air cylinder control | |
| Gas circuit system | 2-circuit mass flow controller | |
| Computer control system | Fully automated control by PLC+IPC+touch screen | |
| Optional accessories | Film thickness gauge, air pump, cooling water circulator | |
| Space occupied | Main unit | 1000×1800mm2 |
| Electric cabinet | 900×600mm2 | |
SINGLE CHAMBER MAGNETRON SPUTTERING SYSTEM is used for the preparation of novel thin film materials such as nanometer single-layer and multi-layer functional film, hard film, metal film, semiconductor film and dielectric film. It can be widely used in the research of thin film materials and the production of small batch. It can be widely used in universities and colleges, scientific research institutes of thin film materials preparation research and small batch.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Vacuum chamber | Circular type vacuum chamber, size: Ø450×350mm |
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| Vacuum system configuration | Compound molecular pump, mechanical pump, gate valve | |
| ultimate pressure | ≦6.67*10-5Pa(After baking degassing) | |
| Vacuum recovery time | Up to 6. 6*10-4Pa in 40 minutes. (the system briefly exposes the atmosphere and fills with dry nitrogen to start pumping) | |
| Magnetron target component | 3 sets of permanent magnetic targets; target sizeØ60mm(one of the targets can sputtering ferromagnetic material). The RF beach and DC cutoff of each target are compatible; and the distance between target and sample is adjustable from 90mm to 100mm; when direct upward sputtering, the distance between target and samle is adjustable from 40mm to 80mm. | |
| Water-cooling Substrate Heating Revolution Table | Substrate Structure | The substrate heating and water cooling work independently, and the heating furnace can be replaced by water cooling substrates |
| Sample size | Ø30mm | |
| Mode of motion | The substrate can rotate continuously, and the rotation speed is 5-10 RPM | |
| Heating | Max. Temperature 600℃±1℃ | |
| Substrate Negative Bias | -200V | |
| Gas Circuit System | 2-way Mass Flow Controller(MFC) | |
| Optional parts 6 station base plate heating revolution table | Removing the single substrate, The water heating platform can be replaced on the rotary table. 6 sheets of 30mm substrates can be placed simultaneously; Among the six stations, one of them is installed with heating furnace, while the rest are natural cooling substrates. Maximum temperature of substrate heating: 600℃±1℃ | |
| Computer Control System | Control sample rotation, baffle switch, target identification, etc | |
| Floor Occupied | Main Set | 1300×800mm2 |
| Electrical Cabinet | 700×700mm2 | |
PROGRAMMABLE SINGLE CHAMBER MAGNETRON SPUTTERING COATER is a single-chamber structure, mainly composed of sputtering vacuum chamber, magnetron sputtering target, ion bombardment, revolution substrate, optical heating system, sputtering power supply, working gas path, vacuum acquisition system, installation machine, vacuum measurement, water cooling, alarm system and control system, etc.
The system is controlled by IPC and PLC, with two modes of automatic and manual control. In addition to put the sample, all other processes are realized on the touch screen. It provides man-machine operation interface such as vacuum system, sputtering process setting, filling and venting system, etc. On the IPC, you can set parameters through the formula, to implement the procedure process and equipment parameter Settings.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Sputtering chamber vacuum limit | ≤8.0×10-6Pa | |
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| Vacuum recovery time | The system was pumped from atmosphere to 1.0×10-3 Pa within 15minutes | |
| Uniformity | Film thickness nonuniformity≤±5%; nonuniformity between the slices≤±5%; Inhomogeneity between batches≤±5% | |
| Sputtering vacuum chamber | The cylindrical structure, size 800mmx250mm | |
| Magnetron sputtering system | Permanent magnet target 4, target size 6 inches; One imported power supply (rf or dc pulse optional)； Sputtering rate: 0.5 ~ 5 angstrom per second (target Al) |
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| Revolution base plate | 6 inches 6 pieces (4 inches 12 pieces or 3 inches 16 pieces); The substrate revolution is 3~15 revolution/min, continuously adjustable, and the common rotation composite worktable is optional |
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| Light heating system | Sample heating temperature: room temperature to 250 ℃, continuous adjustable; Substrate temperature nonuniformity: ≤±10℃; Temperature control method is PID automatic temperature control and digital display, equipped with imported temperature control meter. |
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| Working gas path | 2 way mass flow controller (MFC) | |
| Air pump composition | Cryopump (imported), Roots dry pump set, air gate valve (imported), pipes | |
| Vacuum measurement | System vacuum, working vacuum and backing vacuum was precisely measured by 2 vacuum gauges (imported); the vacuum degree can be displayed visually on the touch screen of industrial computer; the vacuum degree of the sputtering coating process can be monitored accurately. | |
| Control system | The entire system can be controlled by IPC (touch screen) and PLC (imported) | |
| Space occupied | Main set | 1500×1000mm2 |
| electric control cabinet | 700×700mm2(one) | |
NST PLASMA MAGNETRON SPUTTERING COATER is an excellent and cost effective coater for coating thin film of non-conductive material in RF plasma magnetron sputtering coater is small in size, occupies less laboratory space, simple in operation and widely used. Therefore, it is widely used in the laboratories of major universities and research institutes.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Input Power | 220 VAC, 50/60Hz, single phase 800 W (including pump) If the voltage is 110 VAC, a 1000 W transformer is required |
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| Source Power | One 13.5 MHz, 300 W RF Generator with automatic matching function is built in cabinet and connected to 2″ sputtering head |
| Magnetron Sputtering Head | One 2″ Magnetron Sputtering Heads with water cooling jackets are included and inserted into quartz chamber via quick clamp One shutter is built on the flange (manually operated) One 16 L/min digitally controlled recirculation water chiller is installed on bottom cabinet for cooling magnetron sputtering heads. |
| Sputtering Target | Target size requirement: 2″ diameter×1/4″thickness Max One SiO2 target is included for demo test. Al2O3 ceramic target Recommend Coating Method |
| Vacuum Chamber | Vacuum Chamber: 160 mm OD×150 mm ID ×250 mm Height. made of high purity quartz Sealing Flange: 165 mm Dia. made of Aluminum with high-temperature silicone O-ring Stainless steel mesh cover is included for 100% shielding RF radiation from chamber Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump and 1.0E-5 Torr with optional turbo pump |
| Sample Holder | Sample holder is rotatable and heat-able made of a ceramic heater with stainless steel cover The sample holder size: 50 mm Dia. for 2″ wafer max Rotation speed is adjustable: 1-10 rpm for uniform coating The holder temperature is adjustable from RT to 400°C Max with accuracy +/- 1.0 °C via digital temperature controller. |
| Vacuum Pump Station | KF25 Vacuum port is built in for connecting to a vacuum pump. Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump |
HIGH VACUUM MAGNETRON SPUTTERING COATER is used for the preparation of novel thin film materials such as nanometer single-layer and multi-layer functional film, hard film, metal film, semiconductor film and dielectric film. It can be widely used in the research of thin film materials and the production of small batch. It can be widely used in universities and colleges, scientific research institutes of thin film materials preparation research and small batch.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Vacuum chamber | Piriform vacuum chamber, size: Ø450×350mm | |
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| Vacuum system configuration | Compound molecular pump, mechanical pump, gate valve | |
| ultimate pressure | ≤2.0*10-5Pa(After baking degassing) | |
| Vacuum recovery time | Up to 6.6*10-4Pa in 40 minutes. (the system briefly exposes the atmosphere and fills with dry nitrogen to start pumping) | |
| Magnetron target component | 5 sets of permanent magnetic targets; target sizeØ60mm(one of the targets can sputtering ferromagnetic material). The RF beach and DC cutoff of each target are compatible.; and the distance between target and sample is adjustable from 90mm to 130mm. | |
| Water-cooling Substrate Heating Revolution Table | Substrate structure | Six stations, heating furnace installed at one of these stations, and the others are water cooling substrate station. |
| Sample size | Ø30mm, 6 pieces can be placed | |
| Mode of motion | 0~360℃, reciprocating rotary | |
| Heating | Max. Temperature 600℃±1℃ | |
| Substrate Negative Bias | -200V | |
| Gas Circuit System | 2-circuit mass flow controller | |
| Computer Control System | Control sample rotation, baffle switch, target identification, etc | |
| Space Occupied | Main Set | 1300×800mm2 |
| Electrical Cabinet | 700×700mm2 | |
CUSTOMIZED 5 HEADS NST PLASMA MAGNETRON SPUTTERING COATER is particularly suitable for exploring solid electrolyte materials, combined by 5 different elements in 16 different ratios.This equipment is mainly used to make an oxide film on a single crystal substrate, so there is no need for a high vacuum environment.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Details
| Features | 5 magnetron sputtering guns for 5 different target materials Depending on the power supplies used (RF or DC), both metallic and non-metallic materials can be deposited. Capable of sputtering 5 target materials to produce various compositions via different sputtering times / rates With optional 5 power supplies, 5 target materials can be sputtered at the same time for combinatorial sputtering 16 samples can be deposited in one batch with a mask and a rotating sample holder |
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| Input Power | Single phase 220 VAC, 50 / 60 Hz 1000 W (including vacuum pump and water chiller) |
| Power Source | One 13.5 MHz,300 W auto-match RF generator is included and connected to the sputtering heads The rotatable switch can activate one sputtering head at a time. Sputtering heads can be switched “in the plasma” without breaking of vacuum during a multilayer process. Multiple RF power supplies are optional, which allows user to sputter multi-target at the same time for combinatorial sputtering Laptop with control software is available at extra cost to control each RF gun’s sputtering time and power |
| Magnetron Sputtering Head | Five 1″ magnetron sputtering heads with water cooling jackets are included and inserted into quartz chamber via quick clamps One manually operated shutter is built on the flange One 10 L/min digitally controlled recirculating water chiller is included for cooling sputtering heads |
| Sputtering Target | Target size requirement: 1″ diameter×1/8″ thickness max Sputtering distance range: 50 – 80 mm adjustable Sputtering angle range: 0 – 25° adjustable 1″ diameter Cu target and Al2O3 target are included for demo testing |
| Vacuum Chamber |
Vacuum chamber is made of 304 stainless steel with reinforcing rib Inside vacuum chamber size: 470 mm L×445 mm D×522 mm H (~105 Liters, 18.5“×17.5″× 20.5″) Round 380 mm Dia. hinged type door with 150 mm Dia glass window Temperature range: -15 to 150 °C Vacuum level: 4.0E-5 torr with turbo pump |
| Sample Holder |
150 mm diameter rotatable sample holder for coating 16 sample one one batch with different compositions Sample holder and mask rotation can be controlled manually by a button or automatically by a control software (Optional) The sample holder temperature is adjustable from RT to 600 °C max |
| Vacuum Pump | KF40 vacuum port is built in for connecting to a vacuum pump. A compact turbo pump is included 4.0E-5 Torr with optional turbo pump |
COMBINATORIAL PLASMA SPUTTERING COATER is also suitable for sequential coating of multiple layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE, etc.Compared with similar equipment, it is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material films, especially suitable for laboratory research on solid electrolytes and OLEDs.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Input Power | Single phase 220 VAC 50 / 60 Hz 2000 W (including vacuum pump and water chiller) |
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| Source Power | Three sputtering power sources are integrated into one control box. DC source: 500 W power for coating metallic materials. RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials. |
| Magnetron Sputtering Head | Three 2″ Magnetron Sputtering Heads with water cooling jackets and shutters are included. One Sputting Head Model also available. Target size requirement: 2″ diameter Thickness range: 0.1 – 5 mm for both metallic and non-conductive targets (including backing plate) One Stainless Steel Target and one Research Grade Al2O3 target are included for demo testing Customized coater: Two DC – One RF; Two RF – One DC; Three DC; Three RF |
| Vacuum Chamber | Vacuum chamber: 300 mm Dia.×300 mm Height, made of stainless steel Viewport: Two pieces of 100 mm Dia. glass. One fixed; one detachable for cleaning and replacement Hinged type lid with pneumatic power pole allows easy target change |
| Sample Stage | Sample holder is a rotatable and heatable stage made of ceramic heater with copper cover Sample holder size: 140 mm Dia. for. 4″ wafer max Rotation speed: 1 – 20 rpm adjustable for uniform coating The holder temperature is adjustable from RT to 500 °C max (2h max) with accuracy +/- 1.0 °C via a digital temperature controller |
| Gas Flow Control | Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gases Flow rate: 0 – 200 mL/min & 0 – 100ml/min adjustable on the touch screen control panel Air inlet valve is installed for vacuum release |
| Vacuum Pump Station | A mobile pump station is included. The sputtering coater can be placed on top of station High-speed turbo pump at speed 80L/S is combined with a two-stage mechanical pump (220 L/min) for max vacuum level and faster pumping speed Standard vacuum level connected with chamber : < 4.0E-5 Torr. . (1.0E-6 Torr with chamber baking ) |
| Water Chiller | One digital temperature controlled recirculating water chiller is included. Refrigeration range: 5~35 °C Flow rate: 16 L/min Pump pressure: 14 psi |
| Overall Dimensions | Lid closed: 48″ × 28″ × 32″ Lid open: 48″ × 28″ × 37″ |
HIGH POWER NST MAGNETRON SPUTTERING COATER uses PLC control panel to control the equipment, which is convenient and intuitive to operate.It has a 2-inch water cooling target head and a rotatable sample stage, The water cooling target makes the surface of the sample after coating not deformed due to excessive coating temperature, and even damages the sample; the sample stage can be rotated, and the sample can be rotated while coating to make the surface of the sample uniform after coating. The device is small in size and cost-effective. It is an ideal coating equipment for making various metal films. It can be equipped with various metal targets and vacuum pump.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Input Voltage | 220VAC 50/60Hz ,110 V power is available by using a 1000 W transformer (15 A fuse). |
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| Output Power | 1600 VDC 250 W 150 mA max. Built-in over current protection (>150 mA) |
| Specimen Chamber | Quartz glass tube, 165 mm OD.×150 mm ID×250 mm Height |
| Sputtering Head &Specimen Stage | 2” flexible magnetron sputtering head with water cooling jacket is included One 50 mm Dia stainless steel sample stage is rotatable from 0 – 5 RPM One manually operated shutter for target protection. Sputtering head holder is available for holding sputtering head while non-operation. The distance between the sputtering head and sample stage is adjustable from 60 – 100 mm. Max Coating area: 4″ diameter max. One Air Cold Recirculating Water Chiller 10 L/min Flow is included for cooling sputtering head. |
| Control Panel | 6” color touch-screen control panel with PLC integration for easy operation. One panel for all parameters monitor and control: vacuum, current. |
| Ultimate Vacuum Pressure | Built-in KF25 vacuum port The system requires an Ar gas tank with pressure regulator. (not included) < 1.0E-2 Torr by Vane vacuum pump (not included) for Au, Ag, Pt, Cu, Mo targets (not sensitive to air) < 1.0E-5 Torr by Turbomolecular pump (not included) for Al, Mg, Li, Lr, Ti, Zn targets (sensitive to air) The lowest vacuum may reach <4.0E-6 Torr by pumping overnight and baking |
| Gas Atmosphere | One needle valve installed to allow Ar gas inlet to achieve better plasma coating The system requires an Ar gas tank with pressure regulator (not included) |
| Target | l One 2″ Copper target is included for testing, Target size: 2″ Dia.×2.5mm. l It also can coat Ag, Al, Cr, Ni, Pt, Ti, Sn, Li, Mg, etc. almost every kind of metallic material. l Warning: Aluminum ,Chromium or Nickel Target can be coating by this machine, but please view the Recommend Coating Method before using.Please using RF Plasma Magnetron Sputtering for coating Alumina |
DUAL TARGET RF MAGNETRON SPUTTERING COATER is equipped with 300W power supply and 500W DC power supply. The DC power supply can be used for the preparation of metal film, and the power supply can be used for the preparation of non-metal films. The two targets can meet the needs of multi-layer coatings. If customers have other coating needs, DC power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications.
The coating machine has a two-channel high precision mass flow meter. If customers have other requirements, the gas channel of up to four-channel mass flow meter can be customized to meet the complex gas environment requirements. The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase.
In addition, this machine is equipped with two high precision film thickness gauges, which can meet the film thickness detection requirements during the coating process. If customers need to install multiple film thickness gauges, also can contact our technical staff for customization.
This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
Dual-target magnetron sputtering coater application:
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Sample stage | Size | φ185mm | Temperature control accuracy | ±1℃ |
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| Heating temperature | Max 500℃ | Rotate speed | 1-20rpm adjustable | |
| Magnetron Sputtering target head | Quantity | 2”×2 (1”,2” optional) | Water chiller | Circulating water chiller with flow rate of 10L/min |
| Cooling mode | Water cooling | |||
| Vacuum chamber | Chamber size | φ300mm×300mm | Watch window | φ100mm |
| Chamber material | Stainless steel | Opening mode | Top cover open | |
| Mass flowmeter | 2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs) | |||
| Vacuum system | Model | NST-GZK103-A | Pumping interface | KF40 |
| Molecular pump | NST-600 | Exhaust interface | KF16 | |
| Backing pump | rotary vane pump | Vacuum measurement | Compound vacuum gauge | |
| Ultimate vacuum | 1.0E-5Pa | Power supply | AC;220V 50/60Hz | |
| Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes |
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| Power configuration | Quantity | NST power supply×2 | Max output power | RF 300 W |
DUAL-TARGET MAGNETRON SPUTTERING COATER is equipped with two 300W power supply. The DC power supply can be used for the preparation of metal film, and the RF power supply can be used for the preparation of non-metal. The two targets can meet the needs of multi-layer or multiple coatings.
The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
Dual-target magnetron sputtering coater application:
This device can be used for preparing single-layer or multi-layer ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Sample stage | Size | φ185mm | Temperature control accuracy | ±1℃ |
|---|---|---|---|---|
| Heating temperature | Max 500℃ | Rotate speed | 1-20rpm adjustable | |
| Magnetron Sputtering target head | Quantity | 2”×2 (1”,2” optional) | Water chiller | Circulating water chiller with flow rate of 10L/min |
| Cooling mode | Water cooling | |||
| Vacuum chamber | Chamber size | φ300mm×300mm | Watch window | φ100mm |
| Chamber material | Stainless steel | Opening mode | Top cover open | |
| Mass flowmeter | 2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs) | |||
| Vacuum system | Model | NST-GZK103-A | Pumping interface | KF40 |
| Molecular pump | NST-600 | Exhaust interface | KF16 | |
| Backing pump | rotary vane pump | Vacuum measurement | Compound vacuum gauge | |
| Ultimate vacuum | 1.0E-5Pa | Power supply | AC;220V 50/60Hz | |
| Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes |
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| Power configuration | Quantity | NST power supply×2 | Max output power | NST 300 W |
| Other parameters | Supply voltage | AC220V,50Hz | Overall size | 600mm×650mm×1280mm |
| Total power | 2.5KW | Total Weight | About 300kg | |
NST DUAL-TARGET MAGNETRON SPUTTERING COATER is equipped with a 500W DC power supply and a 300W RF power supply. The DC power supply can be used for the preparation of metal film, and the RF power supply can be used for the preparation of non-metal. The two targets can meet the needs of multi-layer or multiple coatings.
The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
Dual-target magnetron sputtering coater application:
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Sample stage | Size | φ185mm | Temperature control accuracy | ±1℃ |
|---|---|---|---|---|
| Heating temperature | Max 500℃ | Rotate speed | 1-20rpm adjustable | |
| Magnetron Sputtering target head | Quantity | 2”×2 (1”,2” optional) | Water chiller | Circulating water chiller with flow rate of 10L/min |
| Cooling mode | Water cooling | |||
| Vacuum chamber | Chamber size | φ300mm×300mm | Watch window | φ100mm |
| Chamber material | Stainless steel | Opening mode | Top cover open | |
| Mass flowmeter | 2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs) | |||
| Vacuum system | Model | NST-GZK103-A | Pumping interface | KF40 |
| Molecular pump | NST-600 | Exhaust interface | KF16 | |
| Backing pump | rotary vane pump | Vacuum measurement | Compound vacuum gauge | |
| Ultimate vacuum | 1.0E-5Pa | Power supply | AC;220V 50/60Hz | |
| Pumping rate | Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes |
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| Power configuration | Quantity | DC power supply×1 RF power supply×1 |
Max output power | DC 500W, RF 300 W |
| Other parameters | Supply voltage | AC220V,50Hz | Overall size | 600mm×650mm×1280mm |
| Total power | 2.5KW | Total Weight | About 300kg | |
COMPACT DC MAGNETRON SPUTTERING COATER is designed to make some metal films, the film area can be up to 4 inches.It has a 2 inch size and the height between the sample stage and the sputter head can be adjusted between 30 and 80 mm. A manually operable sputter baffle is installed for pre-sputtering. The sputtering time of the sputtering head can be adjusted between 1 and 120 s. If you want a thin film, the sputtering time can be set shorter; if you want a thick film, the sputtering time can be longer.The device is small in size and cost-effective. It is an ideal coating equipment for making various metal films. It can be equipped with various metal targets and vacuum pump.
Technical Specifications
| Feature | 1.Specially Designed for coating conductive gold film for SEM sample. 2.Compact plasma sputtering coater designed for metallic coatings, such as gold, platinum, and silver. 3.One 2″ gold (4N) target is included. |
|---|---|
| Input Voltage | 220 VAC 50/60Hz, 200W < 1000 W (including vacuum pump power) 110VAC power is available by using a 1000 W transformer (15 A fuse). The transformer is sold separately. |
| Output Voltage | 500 VDC |
| Sputtering current | 0 – 50 mA (max.) adjustable sputtering current Digital current meter (mA) Over-current protection |
| Sputtering time | 1 -120 seconds adjustable |
| Specimen Chamber | Quartz glass tube, 165 mm OD.×150 mm ID×150 mm Height |
| Specimen Stage | 2″ diameter,height adjustable, 30 – 80 mm from the sample to the target |
| Sputtering Head | 2″ magnetron sputtering head.One manually operated shutter for target protection. |
| Vacuum Pressure | Digital vacuum pressure meter (Pa) KF25 vacuum pump connector Ultimate vacuum pressure 1 Pa by the mechanical pump. The Pump is not included. |
| Input gas | One 1/4 Swagelok type tube fitting is installed for connecting the inert gas cylinder. One metering valve is in the front panel for adjusting the input gas. |
| Target | One 50mm Dia. x 0.12mm gold target is included. 4N purity gold foil: 50 mm(2 inch) Dia. x 0.12 mm (Included and pre-installed on coater) Optional Targets are available Au target (50 mm Dia.×0.12 mm, 4N purity) Pt target (50 mm Dia.×0.12 mm, 4N purity) Ag target (50 mm Dia.×0.5 mm, 4N purity) This model is suitable for coating Gold, Sliver, Platinium. And it is not suitable for coating light metallic material such as Al, Mg, Zn, or Carbon target due to low energy. Please consider our high power DC/RF magnetron sputtering coater or thermal evaporation coater. |
Magnetron Sputter coater
Additional Information:
Payment Terms : L/C, T/T, Western Union
NST THE SMALL PLASMA SPUTTERING COATER is a cost-effective plasma sputter coating equipment independently developed by our company. It has the advantages of compact structure, easy to use, high integration and strong sense of design. The plasma sputtering target is a standard size of 2 inches. The instrument is equipped with a 150W DC high-voltage power supply, which can be used for metal sputter coating, especially for the coating of precious metals such as gold, silver and copper. It is often used in the preparation of conductive films for laboratory scanning electron microscope samples. It is also called “gold spraying machine”. This film coater is equipped with a gas connection for the introduction of protective gas. If the customer needs to pass the mixed gases, the staff can be contacted to configure the high-precision mass flow meter to meet the experimental needs.
This film coater is equipped with a two-stage rotary vane vacuum pump. It has the advantages of small volume, quick vacuuming and simple operation. If customers need to further improve the vacuum degree, the technician can contact the technician to select the molecular pump group to form a high vacuum system.
Additional Information:
Payment Terms : L/C, T/T, Western Union
Technical Specifications
| Sample stage | Size | Φ60mm | Distance to the sputtering target | 20mm~35mm adjustable |
|---|---|---|---|---|
| DC sputtering target head | Quantity | 2”×1 | ||
| Vacuum chamber | Chamber size | φ180mm×100mm | Watch window | Omnidirectional transparent |
| Chamber material | High purity quartz | Opening mode | Top cover removable | |
| Vacuum system | Mechanical pump | Rotary vane pump | Pumping interface | KF16 |
| Vacuum measurement | Resistance gauge | Exhaust interface | KF16 | |
| Ultimate vacuum | 1.0E-1Pa | Power supply | AC 220V 50/60Hz | |
| Pumping rate | rotary vane vacuum pump: 1.1L/S | |||
| Power configuration | Quantity | DC power supply×1 | Max output power | 150W |
