Chemical Vapor Deposition System in Bangalore

• MOQ : 1 unit
• Pump Type : Rotary Vacuum Pumping System
• Brand/Make : EI
• Structure : Box (or) Cylindrical Horizontally
• Tube Size : 1.2 Mtr Long
• Automation Grade : Manual
• Number of Zones : Single / Two / Three
• Tube Quartz : 50 mm OD
• Design Type : Customised
• Item Code : CVD

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Chemical vapor deposition (CVD) allows a thin film to be grown on a substrate through molecules and molecular fragments adsorbing and reacting on a surface. This example illustrates the modeling of such a CVD reactor where triethyl-gallium first decomposes, and the reaction products along with arsine (AsH3) a more...

Valence Process Equipment offers both production and research-sized MOCVD reactor systems for Group III-Nitride and InGaAl-AsP material systems. We can provide a high degree of customization to suit your specific process requirements.   Valence Process Equipment patented, 500-series platform features a non c more...